Enhanced Temperature Control Method Using ANFIS with FPGA

Temperature control in etching process is important for semiconductor manufacturing technology. However, pressure variations in vacuum chamber results in a change in temperature, worsening the accuracy of the temperature of the wafer and the speed and quality of the etching process. This work develo...

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Vydáno v:	TheScientificWorld Ročník 2014; číslo 2014; s. 1 - 8
Hlavní autoři:	Chang, Cheng-Yuan, Zhou, Jun-Tin, Pan, Shing-Tai, Huang, Chiung-Wei
Médium:	Journal Article
Jazyk:	angličtina
Vydáno:	Cairo, Egypt Hindawi Publishing Corporation 01.01.2014 John Wiley & Sons, Inc Wiley
Témata:	Algorithms Computer engineering Computers Digital integrated circuits Electronics industry Equipment and supplies Experiments Fuzzy algorithms Fuzzy Logic Fuzzy systems Mathematical models Methods Models, Theoretical Plasma etching R&D Research & development Temperature Temperature control
ISSN:	2356-6140, 1537-744X, 1537-744X
On-line přístup:	Získat plný text
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