Enhanced Temperature Control Method Using ANFIS with FPGA
Temperature control in etching process is important for semiconductor manufacturing technology. However, pressure variations in vacuum chamber results in a change in temperature, worsening the accuracy of the temperature of the wafer and the speed and quality of the etching process. This work develo...
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| Vydáno v: | TheScientificWorld Ročník 2014; číslo 2014; s. 1 - 8 |
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| Hlavní autoři: | , , , |
| Médium: | Journal Article |
| Jazyk: | angličtina |
| Vydáno: |
Cairo, Egypt
Hindawi Publishing Corporation
01.01.2014
John Wiley & Sons, Inc Wiley |
| Témata: | |
| ISSN: | 2356-6140, 1537-744X, 1537-744X |
| On-line přístup: | Získat plný text |
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| Shrnutí: | Temperature control in etching process is important for semiconductor manufacturing technology. However, pressure variations in vacuum chamber results in a change in temperature, worsening the accuracy of the temperature of the wafer and the speed and quality of the etching process. This work develops an adaptive network-based fuzzy inference system (ANFIS) using a field-programmable gate array (FPGA) to improve the effectiveness. The proposed method adjusts every membership function to keep the temperature in the chamber stable. The improvement of the proposed algorithm is confirmed using a medium vacuum (MV) inductively-coupled plasma- (ICP-) type etcher. |
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| Bibliografie: | ObjectType-Article-1 SourceType-Scholarly Journals-1 ObjectType-Feature-2 content type line 14 content type line 23 Academic Editors: G. Litak, F. Liu, and B. Yasilata |
| ISSN: | 2356-6140 1537-744X 1537-744X |
| DOI: | 10.1155/2014/239261 |