Enhanced Temperature Control Method Using ANFIS with FPGA

Temperature control in etching process is important for semiconductor manufacturing technology. However, pressure variations in vacuum chamber results in a change in temperature, worsening the accuracy of the temperature of the wafer and the speed and quality of the etching process. This work develo...

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Vydáno v:TheScientificWorld Ročník 2014; číslo 2014; s. 1 - 8
Hlavní autoři: Chang, Cheng-Yuan, Zhou, Jun-Tin, Pan, Shing-Tai, Huang, Chiung-Wei
Médium: Journal Article
Jazyk:angličtina
Vydáno: Cairo, Egypt Hindawi Publishing Corporation 01.01.2014
John Wiley & Sons, Inc
Wiley
Témata:
ISSN:2356-6140, 1537-744X, 1537-744X
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Shrnutí:Temperature control in etching process is important for semiconductor manufacturing technology. However, pressure variations in vacuum chamber results in a change in temperature, worsening the accuracy of the temperature of the wafer and the speed and quality of the etching process. This work develops an adaptive network-based fuzzy inference system (ANFIS) using a field-programmable gate array (FPGA) to improve the effectiveness. The proposed method adjusts every membership function to keep the temperature in the chamber stable. The improvement of the proposed algorithm is confirmed using a medium vacuum (MV) inductively-coupled plasma- (ICP-) type etcher.
Bibliografie:ObjectType-Article-1
SourceType-Scholarly Journals-1
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Academic Editors: G. Litak, F. Liu, and B. Yasilata
ISSN:2356-6140
1537-744X
1537-744X
DOI:10.1155/2014/239261