Enhanced Temperature Control Method Using ANFIS with FPGA

Temperature control in etching process is important for semiconductor manufacturing technology. However, pressure variations in vacuum chamber results in a change in temperature, worsening the accuracy of the temperature of the wafer and the speed and quality of the etching process. This work develo...

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Veröffentlicht in:	TheScientificWorld Jg. 2014; H. 2014; S. 1 - 8
Hauptverfasser:	Chang, Cheng-Yuan, Zhou, Jun-Tin, Pan, Shing-Tai, Huang, Chiung-Wei
Format:	Journal Article
Sprache:	Englisch
Veröffentlicht:	Cairo, Egypt Hindawi Publishing Corporation 01.01.2014 John Wiley & Sons, Inc Wiley
Schlagworte:	Algorithms Computer engineering Computers Digital integrated circuits Electronics industry Equipment and supplies Experiments Fuzzy algorithms Fuzzy Logic Fuzzy systems Mathematical models Methods Models, Theoretical Plasma etching R&D Research & development Temperature Temperature control
ISSN:	2356-6140, 1537-744X, 1537-744X
Online-Zugang:	Volltext
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