Enhanced photoelectrochemical properties of WO3 thin films fabricated by reactive magnetron sputtering

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Bibliographic Details
Published in:International journal of hydrogen energy Vol. 36; no. 8; pp. 4724 - 4731
Main Authors: Vidyarthi, Vinay Shankar, Hofmann, Martin, Savan, Alan, Sliozberg, Kirill, König, Dennis, Beranek, Radim, Schuhmann, Wolfgang, Ludwig, Alfred
Format: Journal Article
Language:English
Published: Kidlington Elsevier 01.04.2011
Subjects:
Alternative fuels. Production and utilization
Applied sciences
Energy
Exact sciences and technology
Fuels
Hydrogen
High-throughput
Magnetron
Hydrogen
Reactive magnetron sputtering
Gas pressure
Steady state
Thin film
Tungsten oxide
Photocurrent
Tungsten
Solar water splitting
Thickness-gradient
Chemical decomposition
Microstructure
Charge transfer
Photooxidation
ISSN:0360-3199
Online Access:Get full text
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ISSN:0360-3199
DOI:10.1016/j.ijhydene.2011.01.087