An XPS study on the surface reduction of V2O5(001) induced by Ar+ ion bombardment

The effect of the irradiation with Al Kalpha X-rays during an XPS measurement upon the surface vanadium oxidation state of a fresh in vacuum cleaved V2O5(001) crystal was examined. Afterwards, the surface reduction of the V2O5(001) surface under Ar+ bombardment was studied. The degree of reduction o...

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Veröffentlicht in:Surface science Jg. 600; H. 17; S. 3512 - 3517
Hauptverfasser: Silversmit, Geert, Depla, Diederik, Poelman, Hilde, Marin, Guy B., De Gryse, Roger
Format: Journal Article
Sprache:Englisch
Veröffentlicht: Lausanne Elsevier Science 01.09.2006
Amsterdam
New York, NY
Schlagworte:
Condensed matter: electronic structure, electrical, magnetic, and optical properties
Condensed matter: structure, mechanical and thermal properties
Cross-disciplinary physics: materials science; rheology
Exact sciences and technology
Physics
Valence
V2p photoelectron core level
V2O5
Transition elements
X-ray photoelectron spectroscopy (XPS)
Vanadium
XPS analysis
Vanadium oxide
Core levels
Vanadium oxidation state
X-ray photoelectron spectra
ISSN:0039-6028
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Zusammenfassung:The effect of the irradiation with Al Kalpha X-rays during an XPS measurement upon the surface vanadium oxidation state of a fresh in vacuum cleaved V2O5(001) crystal was examined. Afterwards, the surface reduction of the V2O5(001) surface under Ar+ bombardment was studied. The degree of reduction of the vanadium oxide was determined by means of a combined analysis of the O1s and V2p photoelectron lines. Asymmetric line shapes were needed to fit the V3+2p photolines, due to the metallic character of V2O3 at ambient temperature. Under Ar+ bombardment, the V2O5(001) crystal surface reduces rather fast towards the V2O3 stoichiometry, after which a much slower reduction of the vanadium oxide occurs.
Bibliographie:ObjectType-Article-2
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content type line 23
ISSN:0039-6028
DOI:10.1016/j.susc.2006.07.006