An XPS study on the surface reduction of V2O5(001) induced by Ar+ ion bombardment
The effect of the irradiation with Al Kalpha X-rays during an XPS measurement upon the surface vanadium oxidation state of a fresh in vacuum cleaved V2O5(001) crystal was examined. Afterwards, the surface reduction of the V2O5(001) surface under Ar+ bombardment was studied. The degree of reduction o...
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| Vydáno v: | Surface science Ročník 600; číslo 17; s. 3512 - 3517 |
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| Hlavní autoři: | , , , , |
| Médium: | Journal Article |
| Jazyk: | angličtina |
| Vydáno: |
Lausanne
Elsevier Science
01.09.2006
Amsterdam New York, NY |
| Témata: | |
| ISSN: | 0039-6028 |
| On-line přístup: | Získat plný text |
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| Shrnutí: | The effect of the irradiation with Al Kalpha X-rays during an XPS measurement upon the surface vanadium oxidation state of a fresh in vacuum cleaved V2O5(001) crystal was examined. Afterwards, the surface reduction of the V2O5(001) surface under Ar+ bombardment was studied. The degree of reduction of the vanadium oxide was determined by means of a combined analysis of the O1s and V2p photoelectron lines. Asymmetric line shapes were needed to fit the V3+2p photolines, due to the metallic character of V2O3 at ambient temperature. Under Ar+ bombardment, the V2O5(001) crystal surface reduces rather fast towards the V2O3 stoichiometry, after which a much slower reduction of the vanadium oxide occurs. |
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| Bibliografie: | ObjectType-Article-2 SourceType-Scholarly Journals-1 ObjectType-Feature-1 content type line 23 |
| ISSN: | 0039-6028 |
| DOI: | 10.1016/j.susc.2006.07.006 |