An XPS study on the surface reduction of V2O5(001) induced by Ar+ ion bombardment

The effect of the irradiation with Al Kalpha X-rays during an XPS measurement upon the surface vanadium oxidation state of a fresh in vacuum cleaved V2O5(001) crystal was examined. Afterwards, the surface reduction of the V2O5(001) surface under Ar+ bombardment was studied. The degree of reduction o...

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Vydáno v:Surface science Ročník 600; číslo 17; s. 3512 - 3517
Hlavní autoři: Silversmit, Geert, Depla, Diederik, Poelman, Hilde, Marin, Guy B., De Gryse, Roger
Médium: Journal Article
Jazyk:angličtina
Vydáno: Lausanne Elsevier Science 01.09.2006
Amsterdam
New York, NY
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ISSN:0039-6028
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Shrnutí:The effect of the irradiation with Al Kalpha X-rays during an XPS measurement upon the surface vanadium oxidation state of a fresh in vacuum cleaved V2O5(001) crystal was examined. Afterwards, the surface reduction of the V2O5(001) surface under Ar+ bombardment was studied. The degree of reduction of the vanadium oxide was determined by means of a combined analysis of the O1s and V2p photoelectron lines. Asymmetric line shapes were needed to fit the V3+2p photolines, due to the metallic character of V2O3 at ambient temperature. Under Ar+ bombardment, the V2O5(001) crystal surface reduces rather fast towards the V2O3 stoichiometry, after which a much slower reduction of the vanadium oxide occurs.
Bibliografie:ObjectType-Article-2
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content type line 23
ISSN:0039-6028
DOI:10.1016/j.susc.2006.07.006