An intelligent MIMO run-to-run controller for semiconductor manufacturing processes based on an enhanced twin-delayed deep deterministic policy gradient algorithm

Achieving accurate target tracking in semiconductor manufacturing processes with complex nonlinearities, strong coupling, and uncertain disturbance environments poses a formidable challenge to run-to-run (RtR) control. In this study, we propose an innovative approach for the online refinement of mul...

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Bibliographic Details

Published in:	Applied intelligence (Dordrecht, Netherlands) Vol. 55; no. 10; p. 732
Main Authors:	Ma, Zhu, Chen, Yonglin, Pan, Tianhong
Format:	Journal Article
Language:	English
Published:	Boston Springer Nature B.V 01.06.2025
Subjects:	Algorithms Chemical-mechanical polishing Deep learning Effectiveness Harnesses Manufacturing Nonlinearity Semiconductors Tracking
ISSN:	0924-669X, 1573-7497
Online Access:	Get full text
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