Enhanced Temperature Control Method Using ANFIS with FPGA
Temperature control in etching process is important for semiconductor manufacturing technology. However, pressure variations in vacuum chamber results in a change in temperature, worsening the accuracy of the temperature of the wafer and the speed and quality of the etching process. This work develo...
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| Published in: | TheScientificWorld Vol. 2014; no. 2014; pp. 1 - 8 |
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| Main Authors: | , , , |
| Format: | Journal Article |
| Language: | English |
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Cairo, Egypt
Hindawi Publishing Corporation
01.01.2014
John Wiley & Sons, Inc Wiley |
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| ISSN: | 2356-6140, 1537-744X, 1537-744X |
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| Abstract | Temperature control in etching process is important for semiconductor manufacturing technology. However, pressure variations in vacuum chamber results in a change in temperature, worsening the accuracy of the temperature of the wafer and the speed and quality of the etching process. This work develops an adaptive network-based fuzzy inference system (ANFIS) using a field-programmable gate array (FPGA) to improve the effectiveness. The proposed method adjusts every membership function to keep the temperature in the chamber stable. The improvement of the proposed algorithm is confirmed using a medium vacuum (MV) inductively-coupled plasma- (ICP-) type etcher. |
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| AbstractList | Temperature control in etching process is important for semiconductor manufacturing technology. However, pressure variations in vacuum chamber results in a change in temperature, worsening the accuracy of the temperature of the wafer and the speed and quality of the etching process. This work develops an adaptive network-based fuzzy inference system (ANFIS) using a field-programmable gate array (FPGA) to improve the effectiveness. The proposed method adjusts every membership function to keep the temperature in the chamber stable. The improvement of the proposed algorithm is confirmed using a medium vacuum (MV) inductively-coupled plasma- (ICP-) type etcher. Temperature control in etching process is important for semiconductor manufacturing technology. However, pressure variations in vacuum chamber results in a change in temperature, worsening the accuracy of the temperature of the wafer and the speed and quality of the etching process. This work develops an adaptive network-based fuzzy inference system (ANFIS) using a fieldprogrammable gate array (FPGA) to improve the effectiveness. The proposed method adjusts every membership function to keep the temperature in the chamber stable. The improvement of the proposed algorithm is confirmed using a medium vacuum (MV) inductively-coupled plasma- (ICP-) type etcher. Temperature control in etching process is important for semiconductor manufacturing technology. However, pressure variations in vacuum chamber results in a change in temperature, worsening the accuracy of the temperature of the wafer and the speed and quality of the etching process. This work develops an adaptive network-based fuzzy inference system (ANFIS) using a field-programmable gate array (FPGA) to improve the effectiveness. The proposed method adjusts every membership function to keep the temperature in the chamber stable. The improvement of the proposed algorithm is confirmed using a medium vacuum (MV) inductively-coupled plasma- (ICP-) type etcher.Temperature control in etching process is important for semiconductor manufacturing technology. However, pressure variations in vacuum chamber results in a change in temperature, worsening the accuracy of the temperature of the wafer and the speed and quality of the etching process. This work develops an adaptive network-based fuzzy inference system (ANFIS) using a field-programmable gate array (FPGA) to improve the effectiveness. The proposed method adjusts every membership function to keep the temperature in the chamber stable. The improvement of the proposed algorithm is confirmed using a medium vacuum (MV) inductively-coupled plasma- (ICP-) type etcher. |
| Audience | Academic |
| Author | Chang, Cheng-Yuan Zhou, Jun-Tin Pan, Shing-Tai Huang, Chiung-Wei |
| AuthorAffiliation | 1 Department of Electronic Engineering, Chien Hsin University of Science and Technology, Jhongli 320, Taiwan 3 Department of Electrical Engineering, Chung Yuan Christian University, Jhongli 320, Taiwan 2 Department of Computer Science and Information Engineering, National University of Kaohsiung, Kaohsiung 811, Taiwan |
| AuthorAffiliation_xml | – name: 3 Department of Electrical Engineering, Chung Yuan Christian University, Jhongli 320, Taiwan – name: 1 Department of Electronic Engineering, Chien Hsin University of Science and Technology, Jhongli 320, Taiwan – name: 2 Department of Computer Science and Information Engineering, National University of Kaohsiung, Kaohsiung 811, Taiwan |
| Author_xml | – sequence: 1 fullname: Chang, Cheng-Yuan – sequence: 2 fullname: Zhou, Jun-Tin – sequence: 3 fullname: Pan, Shing-Tai – sequence: 4 fullname: Huang, Chiung-Wei |
| BackLink | https://www.ncbi.nlm.nih.gov/pubmed/24715808$$D View this record in MEDLINE/PubMed |
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| CitedBy_id | crossref_primary_10_1016_j_neunet_2016_02_004 crossref_primary_10_1155_2023_1029575 |
| Cites_doi | 10.1016/j.conengprac.2012.09.004 10.1109/27.649628 10.1109/TPS.2002.1024272 10.1016/j.isatra.2012.06.008 10.1007/s11071-012-0642-5 10.1016/j.ymssp.2012.07.009 10.1109/27.640703 10.1016/j.engappai.2012.07.011 10.1116/1.1385904 10.1016/j.conengprac.2012.11.001 10.1016/j.jfranklin.2013.02.016 10.1016/j.jfranklin.2011.10.012 10.1109/LPT.2012.2208949 10.1016/j.jfranklin.2009.09.002 10.1109/21.256541 10.1109/TIE.2005.851663 |
| ContentType | Journal Article |
| Copyright | Copyright © 2014 Chiung-Wei Huang et al. COPYRIGHT 2014 John Wiley & Sons, Inc. Copyright © 2014 Chiung-Wei Huang et al. Chiung-Wei Huang et al. This is an open access article distributed under the Creative Commons Attribution License, which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited. Copyright © 2014 Chiung-Wei Huang et al. 2014 |
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| Snippet | Temperature control in etching process is important for semiconductor manufacturing technology. However, pressure variations in vacuum chamber results in a... |
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| SubjectTerms | Algorithms Computer engineering Computers Digital integrated circuits Electronics industry Equipment and supplies Experiments Fuzzy algorithms Fuzzy Logic Fuzzy systems Mathematical models Methods Models, Theoretical Plasma etching R&D Research & development Temperature Temperature control |
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| Title | Enhanced Temperature Control Method Using ANFIS with FPGA |
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