Development of a broadband Mueller matrix ellipsometer as a powerful tool for nanostructure metrology

Ellipsometric scatterometry has gained wide industrial applications in semiconductor manufacturing after ten years of development. Among the various types of ellipsometers, Mueller matrix ellipsometer (MME) can provide all 16 elements of the 4 by 4 Mueller matrix, and consequently, MME-based scatter...

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Vydané v:	Thin solid films Ročník 584; s. 176 - 185
Hlavní autori:	Liu, Shiyuan, Chen, Xiuguo, Zhang, Chuanwei
Médium:	Journal Article
Jazyk:	English
Vydavateľské údaje:	Elsevier B.V 01.06.2015
Predmet:	Computation Computational metrology Depolarization Ellipsometers Ellipsometry Instrumentation Metrology Mueller matrix ellipsometry Mueller matrix polarimetry Nanometrology Nanostructure Optical metrology Optical scatterometry Semiconductors Thin films Depolarization Mueller matrix ellipsometry Nanometrology Computational metrology Optical scatterometry Mueller matrix polarimetry Nanostructure Optical metrology
ISSN:	0040-6090, 1879-2731
On-line prístup:	Získať plný text
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