Development of a broadband Mueller matrix ellipsometer as a powerful tool for nanostructure metrology

Ellipsometric scatterometry has gained wide industrial applications in semiconductor manufacturing after ten years of development. Among the various types of ellipsometers, Mueller matrix ellipsometer (MME) can provide all 16 elements of the 4 by 4 Mueller matrix, and consequently, MME-based scatter...

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Veröffentlicht in:Thin solid films Jg. 584; S. 176 - 185
Hauptverfasser: Liu, Shiyuan, Chen, Xiuguo, Zhang, Chuanwei
Format: Journal Article
Sprache:Englisch
Veröffentlicht: Elsevier B.V 01.06.2015
Schlagworte:
Computation
Computational metrology
Depolarization
Ellipsometers
Ellipsometry
Instrumentation
Metrology
Mueller matrix ellipsometry
Mueller matrix polarimetry
Nanometrology
Nanostructure
Optical metrology
Optical scatterometry
Semiconductors
Thin films
Depolarization
Mueller matrix ellipsometry
Nanometrology
Computational metrology
Optical scatterometry
Mueller matrix polarimetry
Nanostructure
Optical metrology
ISSN:0040-6090, 1879-2731
Online-Zugang:Volltext
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Zusammenfassung:Ellipsometric scatterometry has gained wide industrial applications in semiconductor manufacturing after ten years of development. Among the various types of ellipsometers, Mueller matrix ellipsometer (MME) can provide all 16 elements of the 4 by 4 Mueller matrix, and consequently, MME-based scatterometry can acquire much more useful information about the sample and thereby can achieve better measurement sensitivity and accuracy. In this paper, the basic principles and instrumentation of MME are presented, and the data analysis in MME-based nanostructure metrology is revisited from the viewpoint of computational metrology. It is pointed out that MME-based nanometrology is essentially a computational metrology technique by modeling a complicated forward process followed by solving a nonlinear inverse problem. Several case studies are finally provided to demonstrate the potential of MME in nanostructure metrology. •Principles of Mueller matrix ellipsometry (MME) based scatterometry are presented.•We developed a broadband dual rotating-compensator Mueller matrix ellipsometer.•The data analysis is revisited from the viewpoint of computational metrology.•Potential of MME in nanostructure metrology is demonstrated using case studies.
Bibliographie:ObjectType-Article-1
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ISSN:0040-6090
1879-2731
DOI:10.1016/j.tsf.2015.02.006