Development of a broadband Mueller matrix ellipsometer as a powerful tool for nanostructure metrology
Ellipsometric scatterometry has gained wide industrial applications in semiconductor manufacturing after ten years of development. Among the various types of ellipsometers, Mueller matrix ellipsometer (MME) can provide all 16 elements of the 4 by 4 Mueller matrix, and consequently, MME-based scatter...
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| Vydáno v: | Thin solid films Ročník 584; s. 176 - 185 |
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| Hlavní autoři: | , , |
| Médium: | Journal Article |
| Jazyk: | angličtina |
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Elsevier B.V
01.06.2015
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| ISSN: | 0040-6090, 1879-2731 |
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| Abstract | Ellipsometric scatterometry has gained wide industrial applications in semiconductor manufacturing after ten years of development. Among the various types of ellipsometers, Mueller matrix ellipsometer (MME) can provide all 16 elements of the 4 by 4 Mueller matrix, and consequently, MME-based scatterometry can acquire much more useful information about the sample and thereby can achieve better measurement sensitivity and accuracy. In this paper, the basic principles and instrumentation of MME are presented, and the data analysis in MME-based nanostructure metrology is revisited from the viewpoint of computational metrology. It is pointed out that MME-based nanometrology is essentially a computational metrology technique by modeling a complicated forward process followed by solving a nonlinear inverse problem. Several case studies are finally provided to demonstrate the potential of MME in nanostructure metrology.
•Principles of Mueller matrix ellipsometry (MME) based scatterometry are presented.•We developed a broadband dual rotating-compensator Mueller matrix ellipsometer.•The data analysis is revisited from the viewpoint of computational metrology.•Potential of MME in nanostructure metrology is demonstrated using case studies. |
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| AbstractList | Ellipsometric scatterometry has gained wide industrial applications in semiconductor manufacturing after ten years of development. Among the various types of ellipsometers, Mueller matrix ellipsometer (MME) can provide all 16 elements of the 4 by 4 Mueller matrix, and consequently, MME-based scatterometry can acquire much more useful information about the sample and thereby can achieve better measurement sensitivity and accuracy. In this paper, the basic principles and instrumentation of MME are presented, and the data analysis in MME-based nanostructure metrology is revisited from the viewpoint of computational metrology. It is pointed out that MME-based nanometrology is essentially a computational metrology technique by modeling a complicated forward process followed by solving a nonlinear inverse problem. Several case studies are finally provided to demonstrate the potential of MME in nanostructure metrology. Ellipsometric scatterometry has gained wide industrial applications in semiconductor manufacturing after ten years of development. Among the various types of ellipsometers, Mueller matrix ellipsometer (MME) can provide all 16 elements of the 4 by 4 Mueller matrix, and consequently, MME-based scatterometry can acquire much more useful information about the sample and thereby can achieve better measurement sensitivity and accuracy. In this paper, the basic principles and instrumentation of MME are presented, and the data analysis in MME-based nanostructure metrology is revisited from the viewpoint of computational metrology. It is pointed out that MME-based nanometrology is essentially a computational metrology technique by modeling a complicated forward process followed by solving a nonlinear inverse problem. Several case studies are finally provided to demonstrate the potential of MME in nanostructure metrology. •Principles of Mueller matrix ellipsometry (MME) based scatterometry are presented.•We developed a broadband dual rotating-compensator Mueller matrix ellipsometer.•The data analysis is revisited from the viewpoint of computational metrology.•Potential of MME in nanostructure metrology is demonstrated using case studies. |
| Author | Liu, Shiyuan Chen, Xiuguo Zhang, Chuanwei |
| Author_xml | – sequence: 1 givenname: Shiyuan orcidid: 0000-0002-0756-1439 surname: Liu fullname: Liu, Shiyuan email: shyliu@hust.edu.cn – sequence: 2 givenname: Xiuguo surname: Chen fullname: Chen, Xiuguo – sequence: 3 givenname: Chuanwei surname: Zhang fullname: Zhang, Chuanwei |
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| Cites_doi | 10.1063/1.1378807 10.1063/1.2062993 10.1364/OE.22.015165 10.1016/j.tsf.2004.04.010 10.1364/JOSAA.12.001068 10.1364/AO.52.006726 10.1016/j.tsf.2003.12.056 10.1364/AO.45.003688 10.1117/12.730855 10.1063/1.4824760 10.1117/12.2035549 10.1364/AO.51.006805 10.1063/1.118064 10.1109/66.920722 10.1364/OE.22.022031 10.1117/1.JMM.12.3.033013 10.1364/JOSAA.16.001997 10.1117/1.OE.51.8.081504 10.1063/1.367101 10.1117/1.JMM.12.1.013004 10.1103/PhysRevB.38.1865 10.1016/j.measurement.2013.04.080 10.1149/06001.0237ecst 10.1063/1.3046117 10.1364/OL.28.000616 10.1364/OL.2.000148 10.1364/JOSAA.26.002327 10.1364/JOSAA.14.002758 10.1080/713821924 10.1364/OE.15.002033 10.1016/j.tsf.2014.01.049 10.1109/TSM.2011.2158862 10.1117/12.773003 10.1364/OE.17.021336 10.1117/1.3514708 |
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| References | Chen, Liu, Zhang, Zhu (bb0060) 2013; 46 Chen, Liu, Zhang, Jiang (bb0065) 2013; 52 Zhang, Liu, Shi, Tang (bb0050) 2009; 26 De Martino, Kim, Garcia-Caurel, Larde, Drévillon (bb0145) 2003; 28 Liu (bb0130) 2013; 8916 Chen, Liu, Gu, Zhang (bb0185) 2014; 571 Patrick, Germer, Ding, Ro, Richter, Soles (bb0030) 2008; 93 Collins, Koh (bb0160) 1999; 16 Forouhi, Bloomer (bb0200) 1988; 38 Chen, Liu, Zhang, Jiang (bb0105) 2013; 12 Azzam, Bashara (bb0010) 1977 Chen, Zhang, Liu (bb0120) 2013; 103 van de Hulst (bb0180) 1981 Bass (bb0140) 2010 Faruk, Zangooie, Angyal, Watts, Sendelbach, Economikos, Herrera, Wilkins (bb0035) 2011; 24 Zhu, Liu, Chen, Zhang, Jiang (bb0055) 2014; 22 Jellison, Modine (bb0205) 1996; 69 Azzam (bb0155) 1978; 2 Jiang, Chu, Hench, Wack (bb0075) 2008; 6922 Arteaga, Freudenthal, Wang, Kahr (bb0165) 2012; 51 Zhu, Liu, Zhang, Chen, Dong (bb0070) 2013; 12 Moharam, Grann, Pommet, Gaylord (bb0080) 1995; 12 Niu, Jakatdar, Bao, Spanos (bb0015) 2001; 14 Li, Hwu, Liu, Rabello, Liu, Hu (bb0115) 2010; 9 Li (bb0085) 1997; 14 Gil, Bernabeu (bb0175) 1986; 33 Huang, Terry (bb0025) 2004; 455 Kim, Paek, Rabello, Lee, Hu, Liu, Hao, McGahan (bb0110) 2009; 17 Novikova, De Martino, Hatit, Drévillon (bb0095) 2006; 45 Liu, Ma, Chen, Zhang (bb0090) 2012; 51 Palik (bb0210) 1991 bb0190 Huang, Kong, Terry (bb0020) 2001; 78 Novikova, De Martino, Bulkin, Nguyen, Drévillon, Popov, Chumakov (bb0100) 2007; 15 Diebold (bb0040) 2001 Garcia-Caurel, De Martino, Drévillon (bb0150) 2004; 455–456 Raymond (bb0045) 2005; 788 Herzinger, Johs, McGahan, Woollam, Paulson (bb0195) 1998; 83 Fujiwara (bb0170) 2007 Postek, Lyons (bb0005) 2007; 6648 Chen, Liu, Zhang, Jiang, Ma, Sun, Xu (bb0125) 2014; 22 Liu, Chen, Zhang (bb0135) 2014; 60 Faruk (10.1016/j.tsf.2015.02.006_bb0035) 2011; 24 Chen (10.1016/j.tsf.2015.02.006_bb0125) 2014; 22 Diebold (10.1016/j.tsf.2015.02.006_bb0040) 2001 Novikova (10.1016/j.tsf.2015.02.006_bb0095) 2006; 45 Li (10.1016/j.tsf.2015.02.006_bb0085) 1997; 14 Garcia-Caurel (10.1016/j.tsf.2015.02.006_bb0150) 2004; 455–456 Azzam (10.1016/j.tsf.2015.02.006_bb0010) 1977 Azzam (10.1016/j.tsf.2015.02.006_bb0155) 1978; 2 Jiang (10.1016/j.tsf.2015.02.006_bb0075) 2008; 6922 Arteaga (10.1016/j.tsf.2015.02.006_bb0165) 2012; 51 Gil (10.1016/j.tsf.2015.02.006_bb0175) 1986; 33 Chen (10.1016/j.tsf.2015.02.006_bb0185) 2014; 571 De Martino (10.1016/j.tsf.2015.02.006_bb0145) 2003; 28 Liu (10.1016/j.tsf.2015.02.006_bb0090) 2012; 51 Novikova (10.1016/j.tsf.2015.02.006_bb0100) 2007; 15 Jellison (10.1016/j.tsf.2015.02.006_bb0205) 1996; 69 Bass (10.1016/j.tsf.2015.02.006_bb0140) 2010 Forouhi (10.1016/j.tsf.2015.02.006_bb0200) 1988; 38 Moharam (10.1016/j.tsf.2015.02.006_bb0080) 1995; 12 Patrick (10.1016/j.tsf.2015.02.006_bb0030) 2008; 93 Chen (10.1016/j.tsf.2015.02.006_bb0065) 2013; 52 van de Hulst (10.1016/j.tsf.2015.02.006_bb0180) 1981 Herzinger (10.1016/j.tsf.2015.02.006_bb0195) 1998; 83 Chen (10.1016/j.tsf.2015.02.006_bb0120) 2013; 103 Palik (10.1016/j.tsf.2015.02.006_bb0210) 1991 Liu (10.1016/j.tsf.2015.02.006_bb0130) 2013; 8916 Fujiwara (10.1016/j.tsf.2015.02.006_bb0170) 2007 Niu (10.1016/j.tsf.2015.02.006_bb0015) 2001; 14 Zhang (10.1016/j.tsf.2015.02.006_bb0050) 2009; 26 Zhu (10.1016/j.tsf.2015.02.006_bb0055) 2014; 22 Li (10.1016/j.tsf.2015.02.006_bb0115) 2010; 9 Huang (10.1016/j.tsf.2015.02.006_bb0020) 2001; 78 Huang (10.1016/j.tsf.2015.02.006_bb0025) 2004; 455 Chen (10.1016/j.tsf.2015.02.006_bb0105) 2013; 12 Liu (10.1016/j.tsf.2015.02.006_bb0135) 2014; 60 Kim (10.1016/j.tsf.2015.02.006_bb0110) 2009; 17 Zhu (10.1016/j.tsf.2015.02.006_bb0070) 2013; 12 Raymond (10.1016/j.tsf.2015.02.006_bb0045) 2005; 788 Postek (10.1016/j.tsf.2015.02.006_bb0005) 2007; 6648 Chen (10.1016/j.tsf.2015.02.006_bb0060) 2013; 46 Collins (10.1016/j.tsf.2015.02.006_bb0160) 1999; 16 |
| References_xml | – volume: 8916 start-page: 891606 year: 2013 ident: bb0130 article-title: Computational metrology for nanomanufacturing publication-title: Proc. SPIE – volume: 78 start-page: 3893 year: 2001 ident: bb0020 article-title: Normal-incidence spectroscopic ellipsometry for critical dimension monitoring publication-title: Appl. Phys. Lett. – volume: 46 start-page: 2638 year: 2013 ident: bb0060 article-title: Improved measurement accuracy in optical scatterometry using fitting error interpolation based library search publication-title: Measurement – ident: bb0190 article-title: ITRS report, 2013 ed. – volume: 455 start-page: 828 year: 2004 ident: bb0025 article-title: Spectroscopic ellipsometry and reflectometry from gratings (scatterometry) for critical dimension measurement and in situ, real-time process monitoring publication-title: Thin Solid Films – volume: 51 start-page: 6805 year: 2012 ident: bb0165 article-title: Mueller matrix polarimetry with four photoelastic modulators: theory and calibration publication-title: Appl. Opt. – volume: 16 start-page: 1997 year: 1999 ident: bb0160 article-title: Dual rotating-compensator multichannel ellipsometer: instrument design for real-time Mueller matrix spectroscopy of surfaces and films publication-title: J. Opt. Soc. Am. A – volume: 26 start-page: 2327 year: 2009 ident: bb0050 article-title: Improved model-based infrared reflectrometry for measuring deep trench structures publication-title: J. Opt. Soc. Am. A – volume: 51 start-page: 081504 year: 2012 ident: bb0090 article-title: Estimation of the convergence order of rigorous coupled-wave analysis for binary gratings in optical critical dimension metrology publication-title: Opt. Eng. – volume: 93 start-page: 233105 year: 2008 ident: bb0030 article-title: Scatterometry for in situ measurement of pattern flow in nanoimprinted polymers publication-title: Appl. Phys. Lett. – year: 1981 ident: bb0180 article-title: Light Scattering by Small Particles – volume: 28 start-page: 616 year: 2003 ident: bb0145 article-title: Optimized Mueller polarimeter with liquid crystals publication-title: Opt. Lett. – volume: 103 start-page: 151605 year: 2013 ident: bb0120 article-title: Depolarization effects from nanoimprinted grating structures as measured by Mueller matrix polarimetry publication-title: Appl. Phys. Lett. – volume: 455–456 start-page: 120 year: 2004 ident: bb0150 article-title: Spectroscopic Mueller polarimeter based on liquid crystal devices publication-title: Thin Solid Films – volume: 12 start-page: 012004 year: 2013 ident: bb0070 article-title: Identification and reconstruction of diffraction structures in optical scatterometry using support vector machine method publication-title: J. Micro/Nanolith. MEMS MOEMS – volume: 15 start-page: 2033 year: 2007 ident: bb0100 article-title: Metrology of replicated diffractive optics with Mueller polarimetry in conical diffraction publication-title: Opt. Express – year: 2007 ident: bb0170 article-title: Spectroscopic Ellipsometry Principles and Applications – volume: 22 start-page: 15165 year: 2014 ident: bb0125 article-title: Accurate characterization of nanoimprinted resist patterns using Mueller matrix ellipsometry publication-title: Opt. Express – volume: 17 start-page: 21336 year: 2009 ident: bb0110 article-title: Device based in-chip critical dimension and overlay metrology publication-title: Opt. Express – volume: 33 start-page: 185 year: 1986 ident: bb0175 article-title: Depolarization and polarization indices of an optical system publication-title: Opt. Acta (Lond.) – volume: 12 start-page: 033013 year: 2013 ident: bb0105 article-title: Measurement configuration optimization for accurate grating reconstruction by Mueller matrix polarimetry publication-title: J. Micro/Nanolith. MEMS MOEMS – volume: 52 start-page: 6726 year: 2013 ident: bb0065 article-title: Improved measurement accuracy in optical scatterometry using correction-based library search publication-title: Appl. Opt. – volume: 69 start-page: 371 year: 1996 ident: bb0205 article-title: Parameterization of the optical functions of amorphous materials in the interband region publication-title: Appl. Phys. Lett. – volume: 6922 start-page: 69221O year: 2008 ident: bb0075 article-title: Forward solve algorithms for optical critical dimension metrology publication-title: Proc. SPIE – volume: 14 start-page: 2758 year: 1997 ident: bb0085 article-title: New formulation of the Fourier modal method for crossed surface-relief gratings publication-title: J. Opt. Soc. Am. A – year: 2010 ident: bb0140 article-title: Handbook of Optics – volume: 38 start-page: 1865 year: 1988 ident: bb0200 article-title: Optical properties of crystalline semiconductors and dielectrics publication-title: Phys. Rev. B – volume: 571 start-page: 653 year: 2014 ident: bb0185 article-title: Formulation of error propagation and estimation in grating reconstruction by a dual-rotating compensator Mueller matrix polarimeter publication-title: Thin Solid Films – volume: 14 start-page: 97 year: 2001 ident: bb0015 article-title: Specular spectroscopic scatterometry publication-title: IEEE Trans. Semicond. Manuf. – volume: 24 start-page: 499 year: 2011 ident: bb0035 article-title: Enabling scatterometry as an in-line measurement technique for 32 publication-title: IEEE Trans. Semicond. Manuf. – volume: 60 start-page: 237 year: 2014 ident: bb0135 article-title: Mueller matrix polarimetry: a powerful tool for nanostructure metrology publication-title: ECS Trans. – volume: 788 start-page: 394 year: 2005 ident: bb0045 article-title: Overview of scatterometry applications in high volume silicon manufacturing publication-title: AIP Conf. Proc. – year: 1977 ident: bb0010 article-title: Ellipsometry and Polarized Light – volume: 22 start-page: 22031 year: 2014 ident: bb0055 article-title: Robust solution to the inverse problem in optical scatterometry publication-title: Opt. Express – year: 2001 ident: bb0040 article-title: Handbook of Silicon Semiconductor Metrology – volume: 45 start-page: 3688 year: 2006 ident: bb0095 article-title: Application of Mueller polarimetry in conical diffraction for critical dimension measurements in microelectronics publication-title: Appl. Opt. – volume: 83 start-page: 3323 year: 1998 ident: bb0195 article-title: Ellipsometric determination of optical constants for silicon and thermally grown silicon dioxide via a multi-sample, multi-wavelength, multi-angle investigation publication-title: J. Appl. Phys. – volume: 6648 start-page: 664802 year: 2007 ident: bb0005 article-title: Instrumentation, metrology, and standards: key elements for the future of nanomanufacturing publication-title: Proc. SPIE – volume: 9 start-page: 041305 year: 2010 ident: bb0115 article-title: Mueller matrix measurement of asymmetric gratings publication-title: J. Micro/Nanolith. MEMS MOEMS – volume: 2 start-page: 148 year: 1978 ident: bb0155 article-title: Photopolarimeter measurement of the Mueller matrix by Fourier analysis of a single detected signal publication-title: Opt. Lett. – year: 1991 ident: bb0210 article-title: Handbook of Optical Constant of Solids – volume: 12 start-page: 1068 year: 1995 ident: bb0080 article-title: Formulation for stable and efficient implementation of the rigorous coupled-wave analysis of binary gratings publication-title: J. Opt. Soc. Am. A – year: 1977 ident: 10.1016/j.tsf.2015.02.006_bb0010 – volume: 78 start-page: 3893 year: 2001 ident: 10.1016/j.tsf.2015.02.006_bb0020 article-title: Normal-incidence spectroscopic ellipsometry for critical dimension monitoring publication-title: Appl. Phys. Lett. doi: 10.1063/1.1378807 – volume: 788 start-page: 394 year: 2005 ident: 10.1016/j.tsf.2015.02.006_bb0045 article-title: Overview of scatterometry applications in high volume silicon manufacturing publication-title: AIP Conf. Proc. doi: 10.1063/1.2062993 – volume: 22 start-page: 15165 year: 2014 ident: 10.1016/j.tsf.2015.02.006_bb0125 article-title: Accurate characterization of nanoimprinted resist patterns using Mueller matrix ellipsometry publication-title: Opt. Express doi: 10.1364/OE.22.015165 – volume: 455 start-page: 828 year: 2004 ident: 10.1016/j.tsf.2015.02.006_bb0025 article-title: Spectroscopic ellipsometry and reflectometry from gratings (scatterometry) for critical dimension measurement and in situ, real-time process monitoring publication-title: Thin Solid Films doi: 10.1016/j.tsf.2004.04.010 – volume: 12 start-page: 1068 year: 1995 ident: 10.1016/j.tsf.2015.02.006_bb0080 article-title: Formulation for stable and efficient implementation of the rigorous coupled-wave analysis of binary gratings publication-title: J. Opt. Soc. Am. A doi: 10.1364/JOSAA.12.001068 – volume: 52 start-page: 6726 year: 2013 ident: 10.1016/j.tsf.2015.02.006_bb0065 article-title: Improved measurement accuracy in optical scatterometry using correction-based library search publication-title: Appl. Opt. doi: 10.1364/AO.52.006726 – volume: 455–456 start-page: 120 year: 2004 ident: 10.1016/j.tsf.2015.02.006_bb0150 article-title: Spectroscopic Mueller polarimeter based on liquid crystal devices publication-title: Thin Solid Films doi: 10.1016/j.tsf.2003.12.056 – volume: 45 start-page: 3688 year: 2006 ident: 10.1016/j.tsf.2015.02.006_bb0095 article-title: Application of Mueller polarimetry in conical diffraction for critical dimension measurements in microelectronics publication-title: Appl. Opt. doi: 10.1364/AO.45.003688 – volume: 6648 start-page: 664802 year: 2007 ident: 10.1016/j.tsf.2015.02.006_bb0005 article-title: Instrumentation, metrology, and standards: key elements for the future of nanomanufacturing publication-title: Proc. SPIE doi: 10.1117/12.730855 – year: 2001 ident: 10.1016/j.tsf.2015.02.006_bb0040 – volume: 103 start-page: 151605 year: 2013 ident: 10.1016/j.tsf.2015.02.006_bb0120 article-title: Depolarization effects from nanoimprinted grating structures as measured by Mueller matrix polarimetry publication-title: Appl. Phys. Lett. doi: 10.1063/1.4824760 – year: 1991 ident: 10.1016/j.tsf.2015.02.006_bb0210 – volume: 8916 start-page: 891606 year: 2013 ident: 10.1016/j.tsf.2015.02.006_bb0130 article-title: Computational metrology for nanomanufacturing publication-title: Proc. SPIE doi: 10.1117/12.2035549 – volume: 51 start-page: 6805 year: 2012 ident: 10.1016/j.tsf.2015.02.006_bb0165 article-title: Mueller matrix polarimetry with four photoelastic modulators: theory and calibration publication-title: Appl. Opt. doi: 10.1364/AO.51.006805 – volume: 69 start-page: 371 year: 1996 ident: 10.1016/j.tsf.2015.02.006_bb0205 article-title: Parameterization of the optical functions of amorphous materials in the interband region publication-title: Appl. Phys. Lett. doi: 10.1063/1.118064 – volume: 14 start-page: 97 year: 2001 ident: 10.1016/j.tsf.2015.02.006_bb0015 article-title: Specular spectroscopic scatterometry publication-title: IEEE Trans. Semicond. Manuf. doi: 10.1109/66.920722 – volume: 22 start-page: 22031 year: 2014 ident: 10.1016/j.tsf.2015.02.006_bb0055 article-title: Robust solution to the inverse problem in optical scatterometry publication-title: Opt. Express doi: 10.1364/OE.22.022031 – volume: 12 start-page: 033013 year: 2013 ident: 10.1016/j.tsf.2015.02.006_bb0105 article-title: Measurement configuration optimization for accurate grating reconstruction by Mueller matrix polarimetry publication-title: J. Micro/Nanolith. MEMS MOEMS doi: 10.1117/1.JMM.12.3.033013 – year: 2010 ident: 10.1016/j.tsf.2015.02.006_bb0140 – volume: 16 start-page: 1997 year: 1999 ident: 10.1016/j.tsf.2015.02.006_bb0160 article-title: Dual rotating-compensator multichannel ellipsometer: instrument design for real-time Mueller matrix spectroscopy of surfaces and films publication-title: J. Opt. Soc. Am. A doi: 10.1364/JOSAA.16.001997 – volume: 51 start-page: 081504 year: 2012 ident: 10.1016/j.tsf.2015.02.006_bb0090 article-title: Estimation of the convergence order of rigorous coupled-wave analysis for binary gratings in optical critical dimension metrology publication-title: Opt. Eng. doi: 10.1117/1.OE.51.8.081504 – volume: 83 start-page: 3323 year: 1998 ident: 10.1016/j.tsf.2015.02.006_bb0195 article-title: Ellipsometric determination of optical constants for silicon and thermally grown silicon dioxide via a multi-sample, multi-wavelength, multi-angle investigation publication-title: J. Appl. Phys. doi: 10.1063/1.367101 – year: 2007 ident: 10.1016/j.tsf.2015.02.006_bb0170 – volume: 12 start-page: 012004 year: 2013 ident: 10.1016/j.tsf.2015.02.006_bb0070 article-title: Identification and reconstruction of diffraction structures in optical scatterometry using support vector machine method publication-title: J. Micro/Nanolith. MEMS MOEMS doi: 10.1117/1.JMM.12.1.013004 – volume: 38 start-page: 1865 year: 1988 ident: 10.1016/j.tsf.2015.02.006_bb0200 article-title: Optical properties of crystalline semiconductors and dielectrics publication-title: Phys. Rev. B doi: 10.1103/PhysRevB.38.1865 – volume: 46 start-page: 2638 year: 2013 ident: 10.1016/j.tsf.2015.02.006_bb0060 article-title: Improved measurement accuracy in optical scatterometry using fitting error interpolation based library search publication-title: Measurement doi: 10.1016/j.measurement.2013.04.080 – volume: 60 start-page: 237 year: 2014 ident: 10.1016/j.tsf.2015.02.006_bb0135 article-title: Mueller matrix polarimetry: a powerful tool for nanostructure metrology publication-title: ECS Trans. doi: 10.1149/06001.0237ecst – volume: 93 start-page: 233105 year: 2008 ident: 10.1016/j.tsf.2015.02.006_bb0030 article-title: Scatterometry for in situ measurement of pattern flow in nanoimprinted polymers publication-title: Appl. Phys. Lett. doi: 10.1063/1.3046117 – volume: 28 start-page: 616 year: 2003 ident: 10.1016/j.tsf.2015.02.006_bb0145 article-title: Optimized Mueller polarimeter with liquid crystals publication-title: Opt. Lett. doi: 10.1364/OL.28.000616 – volume: 2 start-page: 148 year: 1978 ident: 10.1016/j.tsf.2015.02.006_bb0155 article-title: Photopolarimeter measurement of the Mueller matrix by Fourier analysis of a single detected signal publication-title: Opt. Lett. doi: 10.1364/OL.2.000148 – volume: 26 start-page: 2327 year: 2009 ident: 10.1016/j.tsf.2015.02.006_bb0050 article-title: Improved model-based infrared reflectrometry for measuring deep trench structures publication-title: J. Opt. Soc. Am. A doi: 10.1364/JOSAA.26.002327 – volume: 14 start-page: 2758 year: 1997 ident: 10.1016/j.tsf.2015.02.006_bb0085 article-title: New formulation of the Fourier modal method for crossed surface-relief gratings publication-title: J. Opt. Soc. Am. A doi: 10.1364/JOSAA.14.002758 – volume: 33 start-page: 185 year: 1986 ident: 10.1016/j.tsf.2015.02.006_bb0175 article-title: Depolarization and polarization indices of an optical system publication-title: Opt. Acta (Lond.) doi: 10.1080/713821924 – year: 1981 ident: 10.1016/j.tsf.2015.02.006_bb0180 – volume: 15 start-page: 2033 year: 2007 ident: 10.1016/j.tsf.2015.02.006_bb0100 article-title: Metrology of replicated diffractive optics with Mueller polarimetry in conical diffraction publication-title: Opt. Express doi: 10.1364/OE.15.002033 – volume: 571 start-page: 653 year: 2014 ident: 10.1016/j.tsf.2015.02.006_bb0185 article-title: Formulation of error propagation and estimation in grating reconstruction by a dual-rotating compensator Mueller matrix polarimeter publication-title: Thin Solid Films doi: 10.1016/j.tsf.2014.01.049 – volume: 24 start-page: 499 year: 2011 ident: 10.1016/j.tsf.2015.02.006_bb0035 article-title: Enabling scatterometry as an in-line measurement technique for 32nm BEOL application publication-title: IEEE Trans. Semicond. Manuf. doi: 10.1109/TSM.2011.2158862 – volume: 6922 start-page: 69221O year: 2008 ident: 10.1016/j.tsf.2015.02.006_bb0075 article-title: Forward solve algorithms for optical critical dimension metrology publication-title: Proc. SPIE doi: 10.1117/12.773003 – volume: 17 start-page: 21336 year: 2009 ident: 10.1016/j.tsf.2015.02.006_bb0110 article-title: Device based in-chip critical dimension and overlay metrology publication-title: Opt. Express doi: 10.1364/OE.17.021336 – volume: 9 start-page: 041305 year: 2010 ident: 10.1016/j.tsf.2015.02.006_bb0115 article-title: Mueller matrix measurement of asymmetric gratings publication-title: J. Micro/Nanolith. MEMS MOEMS doi: 10.1117/1.3514708 |
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| SubjectTerms | Computation Computational metrology Depolarization Ellipsometers Ellipsometry Instrumentation Metrology Mueller matrix ellipsometry Mueller matrix polarimetry Nanometrology Nanostructure Optical metrology Optical scatterometry Semiconductors Thin films |
| Title | Development of a broadband Mueller matrix ellipsometer as a powerful tool for nanostructure metrology |
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