Development of a broadband Mueller matrix ellipsometer as a powerful tool for nanostructure metrology
Ellipsometric scatterometry has gained wide industrial applications in semiconductor manufacturing after ten years of development. Among the various types of ellipsometers, Mueller matrix ellipsometer (MME) can provide all 16 elements of the 4 by 4 Mueller matrix, and consequently, MME-based scatter...
Uložené v:
| Vydané v: | Thin solid films Ročník 584; s. 176 - 185 |
|---|---|
| Hlavní autori: | , , |
| Médium: | Journal Article |
| Jazyk: | English |
| Vydavateľské údaje: |
Elsevier B.V
01.06.2015
|
| Predmet: | |
| ISSN: | 0040-6090, 1879-2731 |
| On-line prístup: | Získať plný text |
| Tagy: |
Pridať tag
Žiadne tagy, Buďte prvý, kto otaguje tento záznam!
|
| Abstract | Ellipsometric scatterometry has gained wide industrial applications in semiconductor manufacturing after ten years of development. Among the various types of ellipsometers, Mueller matrix ellipsometer (MME) can provide all 16 elements of the 4 by 4 Mueller matrix, and consequently, MME-based scatterometry can acquire much more useful information about the sample and thereby can achieve better measurement sensitivity and accuracy. In this paper, the basic principles and instrumentation of MME are presented, and the data analysis in MME-based nanostructure metrology is revisited from the viewpoint of computational metrology. It is pointed out that MME-based nanometrology is essentially a computational metrology technique by modeling a complicated forward process followed by solving a nonlinear inverse problem. Several case studies are finally provided to demonstrate the potential of MME in nanostructure metrology.
•Principles of Mueller matrix ellipsometry (MME) based scatterometry are presented.•We developed a broadband dual rotating-compensator Mueller matrix ellipsometer.•The data analysis is revisited from the viewpoint of computational metrology.•Potential of MME in nanostructure metrology is demonstrated using case studies. |
|---|---|
| AbstractList | Ellipsometric scatterometry has gained wide industrial applications in semiconductor manufacturing after ten years of development. Among the various types of ellipsometers, Mueller matrix ellipsometer (MME) can provide all 16 elements of the 4 by 4 Mueller matrix, and consequently, MME-based scatterometry can acquire much more useful information about the sample and thereby can achieve better measurement sensitivity and accuracy. In this paper, the basic principles and instrumentation of MME are presented, and the data analysis in MME-based nanostructure metrology is revisited from the viewpoint of computational metrology. It is pointed out that MME-based nanometrology is essentially a computational metrology technique by modeling a complicated forward process followed by solving a nonlinear inverse problem. Several case studies are finally provided to demonstrate the potential of MME in nanostructure metrology. Ellipsometric scatterometry has gained wide industrial applications in semiconductor manufacturing after ten years of development. Among the various types of ellipsometers, Mueller matrix ellipsometer (MME) can provide all 16 elements of the 4 by 4 Mueller matrix, and consequently, MME-based scatterometry can acquire much more useful information about the sample and thereby can achieve better measurement sensitivity and accuracy. In this paper, the basic principles and instrumentation of MME are presented, and the data analysis in MME-based nanostructure metrology is revisited from the viewpoint of computational metrology. It is pointed out that MME-based nanometrology is essentially a computational metrology technique by modeling a complicated forward process followed by solving a nonlinear inverse problem. Several case studies are finally provided to demonstrate the potential of MME in nanostructure metrology. •Principles of Mueller matrix ellipsometry (MME) based scatterometry are presented.•We developed a broadband dual rotating-compensator Mueller matrix ellipsometer.•The data analysis is revisited from the viewpoint of computational metrology.•Potential of MME in nanostructure metrology is demonstrated using case studies. |
| Author | Liu, Shiyuan Chen, Xiuguo Zhang, Chuanwei |
| Author_xml | – sequence: 1 givenname: Shiyuan orcidid: 0000-0002-0756-1439 surname: Liu fullname: Liu, Shiyuan email: shyliu@hust.edu.cn – sequence: 2 givenname: Xiuguo surname: Chen fullname: Chen, Xiuguo – sequence: 3 givenname: Chuanwei surname: Zhang fullname: Zhang, Chuanwei |
| BookMark | eNp9kEFv1DAQhS1UJLaFH8DNRy4JYztxsuKECoVKrbjA2XKcMfIq8QTbKfTf42o5cehlRjN63-jNu2QXkSIy9lZAK0Do96e2ZN9KEH0LsgXQL9hBjMOxkYMSF-wA0EGj4Qiv2GXOJwAQUqoDw0_4gAttK8bCyXPLp0R2nmyc-f2Oy4KJr7ak8IfXIWyZVix1Z3OVbvQbk98XXogW7inxaCPlknZX9oS8ShMt9PPxNXvp7ZLxzb9-xX7cfP5-_bW5-_bl9vrjXeM6rUvj9bGXnVV-nOZ50r2Vczd5PY21eGs79EpPyimJvvcocey9gt5Xt1LKSR_VFXt3vrsl-rVjLmYN2VXjNiLt2YhhADX03TBWqThLXaKcE3qzpbDa9GgEmKdIzcnUSM1TpAakqZFWZviPcaHYEiiWZMPyLPnhTGL9_iFgMtkFjA7nkNAVM1N4hv4LtKWWfw |
| CitedBy_id | crossref_primary_10_1088_2040_8978_18_1_015605 crossref_primary_10_1016_j_tsf_2022_139593 crossref_primary_10_1088_2040_8978_18_5_055701 crossref_primary_10_3390_mi10050293 crossref_primary_10_1039_C9NR04270A crossref_primary_10_1016_j_nwnano_2025_100130 crossref_primary_10_1007_s10118_017_1934_5 crossref_primary_10_3390_app9194091 crossref_primary_10_1557_adv_2017_171 crossref_primary_10_1111_jace_16544 crossref_primary_10_1016_j_tsf_2023_139670 crossref_primary_10_1016_j_apsusc_2024_160896 crossref_primary_10_1016_j_sse_2022_108568 crossref_primary_10_1002_adpr_202100299 crossref_primary_10_1088_1361_6501_aaaeeb crossref_primary_10_1016_j_jeurceramsoc_2018_04_057 crossref_primary_10_1364_AO_55_006844 crossref_primary_10_1063_1_4952385 crossref_primary_10_1016_j_gee_2023_05_006 crossref_primary_10_1364_AO_55_003935 crossref_primary_10_1016_j_apsusc_2021_151219 crossref_primary_10_3389_fphy_2021_814559 crossref_primary_10_1109_ACCESS_2021_3090468 crossref_primary_10_1016_j_apsusc_2017_04_118 crossref_primary_10_1016_j_apsusc_2018_01_051 crossref_primary_10_1038_s41566_024_01461_8 crossref_primary_10_3390_app9040698 crossref_primary_10_3389_fphy_2021_820637 crossref_primary_10_3390_app8122583 crossref_primary_10_1016_j_cirp_2017_05_004 crossref_primary_10_1038_s41467_020_17867_1 crossref_primary_10_1002_adom_201800347 crossref_primary_10_1088_1402_4896_ab2418 crossref_primary_10_3389_fphy_2021_820552 crossref_primary_10_1016_j_measurement_2022_110811 crossref_primary_10_1111_jace_18857 crossref_primary_10_3390_nano13030383 crossref_primary_10_1038_s41566_024_01426_x crossref_primary_10_1038_s42005_024_01890_5 crossref_primary_10_1016_j_cap_2023_06_003 crossref_primary_10_1038_s41377_022_00720_z crossref_primary_10_1080_01431161_2020_1724350 crossref_primary_10_1364_AO_409054 crossref_primary_10_1016_j_apsusc_2019_145091 crossref_primary_10_1364_AO_529935 crossref_primary_10_1016_j_tsf_2015_09_056 crossref_primary_10_3390_s23010051 crossref_primary_10_1016_j_tsf_2023_139695 crossref_primary_10_1134_S002044121905018X crossref_primary_10_1016_j_apsusc_2015_10_167 crossref_primary_10_1016_j_photonics_2021_100949 crossref_primary_10_1088_2051_672X_ade26f crossref_primary_10_1016_j_scriptamat_2019_12_015 crossref_primary_10_3390_nano12223951 crossref_primary_10_1016_j_eurpolymj_2018_11_023 crossref_primary_10_1088_2040_8978_18_2_025702 crossref_primary_10_1016_j_tsf_2023_139739 crossref_primary_10_1007_s11431_022_2090_4 crossref_primary_10_1016_j_tsf_2022_139656 crossref_primary_10_3390_nano13243098 crossref_primary_10_1002_adom_201801250 crossref_primary_10_1007_s11465_019_0573_7 crossref_primary_10_1016_j_tsf_2023_139741 crossref_primary_10_1063_5_0160132 crossref_primary_10_1088_2040_8986_abe35d crossref_primary_10_1515_nanoph_2023_0798 crossref_primary_10_1016_j_solener_2020_10_066 crossref_primary_10_1364_AO_476005 crossref_primary_10_1016_j_jeurceramsoc_2024_04_026 crossref_primary_10_1038_s41377_024_01469_3 crossref_primary_10_3390_nano10081555 crossref_primary_10_1016_j_apsusc_2019_144822 crossref_primary_10_1016_j_polymer_2019_121842 crossref_primary_10_1088_1361_6439_aa7a3a crossref_primary_10_1088_2040_8986_aa9b05 crossref_primary_10_1088_2040_8986_abbf8a crossref_primary_10_1038_s41928_018_0150_9 crossref_primary_10_3390_photonics10091064 crossref_primary_10_1063_1_4937558 crossref_primary_10_1088_1361_6501_aaa8af crossref_primary_10_1088_2051_672X_ab8d85 crossref_primary_10_1088_1361_6501_aaf4d0 crossref_primary_10_3390_mi16080838 crossref_primary_10_1038_s41598_018_34693_0 crossref_primary_10_1364_AO_57_004337 crossref_primary_10_1016_j_joule_2019_06_016 |
| Cites_doi | 10.1063/1.1378807 10.1063/1.2062993 10.1364/OE.22.015165 10.1016/j.tsf.2004.04.010 10.1364/JOSAA.12.001068 10.1364/AO.52.006726 10.1016/j.tsf.2003.12.056 10.1364/AO.45.003688 10.1117/12.730855 10.1063/1.4824760 10.1117/12.2035549 10.1364/AO.51.006805 10.1063/1.118064 10.1109/66.920722 10.1364/OE.22.022031 10.1117/1.JMM.12.3.033013 10.1364/JOSAA.16.001997 10.1117/1.OE.51.8.081504 10.1063/1.367101 10.1117/1.JMM.12.1.013004 10.1103/PhysRevB.38.1865 10.1016/j.measurement.2013.04.080 10.1149/06001.0237ecst 10.1063/1.3046117 10.1364/OL.28.000616 10.1364/OL.2.000148 10.1364/JOSAA.26.002327 10.1364/JOSAA.14.002758 10.1080/713821924 10.1364/OE.15.002033 10.1016/j.tsf.2014.01.049 10.1109/TSM.2011.2158862 10.1117/12.773003 10.1364/OE.17.021336 10.1117/1.3514708 |
| ContentType | Journal Article |
| Copyright | 2015 Elsevier B.V. |
| Copyright_xml | – notice: 2015 Elsevier B.V. |
| DBID | AAYXX CITATION 7SR 7U5 8BQ 8FD JG9 L7M |
| DOI | 10.1016/j.tsf.2015.02.006 |
| DatabaseName | CrossRef Engineered Materials Abstracts Solid State and Superconductivity Abstracts METADEX Technology Research Database Materials Research Database Advanced Technologies Database with Aerospace |
| DatabaseTitle | CrossRef Materials Research Database Engineered Materials Abstracts Solid State and Superconductivity Abstracts Technology Research Database Advanced Technologies Database with Aerospace METADEX |
| DatabaseTitleList | Materials Research Database |
| DeliveryMethod | fulltext_linktorsrc |
| Discipline | Engineering Physics |
| EISSN | 1879-2731 |
| EndPage | 185 |
| ExternalDocumentID | 10_1016_j_tsf_2015_02_006 S0040609015001224 |
| GroupedDBID | --K --M -~X .DC .~1 0R~ 123 1B1 1RT 1~. 1~5 4.4 457 4G. 5VS 7-5 71M 8P~ 9JN AABNK AABXZ AACTN AAEDT AAEDW AAEPC AAIAV AAIKJ AAKOC AALRI AAOAW AAQFI AAXUO ABFNM ABFRF ABJNI ABMAC ABNEU ABXRA ABYKQ ACBEA ACDAQ ACFVG ACGFO ACGFS ACRLP ADBBV ADEZE AEBSH AEFWE AEKER AENEX AEZYN AFKWA AFRZQ AFTJW AGUBO AGYEJ AHHHB AIEXJ AIKHN AITUG AIVDX AJBFU AJOXV ALMA_UNASSIGNED_HOLDINGS AMFUW AMRAJ AXJTR BKOJK BLXMC CS3 DU5 EBS EFJIC EFLBG EJD EO8 EO9 EP2 EP3 F5P FDB FIRID FNPLU FYGXN G-Q GBLVA IHE J1W KOM M24 M38 M41 MAGPM MO0 N9A O-L O9- OAUVE OGIMB OZT P-8 P-9 P2P PC. Q38 RNS ROL RPZ SDF SDG SDP SES SPC SPCBC SPD SSM SSQ SSZ T5K TWZ WH7 ZMT ~G- 29Q 6TJ 9DU AAQXK AATTM AAXKI AAYJJ AAYWO AAYXX ABDPE ABWVN ABXDB ACLOT ACNNM ACRPL ACVFH ADCNI ADMUD ADNMO AEIPS AEUPX AFFNX AFJKZ AFPUW AGHFR AGQPQ AIGII AIIUN AKBMS AKRWK AKYEP ANKPU APXCP ASPBG AVWKF AZFZN BBWZM CITATION EFKBS FEDTE FGOYB G-2 HMV HVGLF HX~ HZ~ NDZJH R2- SEW SMS SPG VOH WUQ ~HD 7SR 7U5 8BQ 8FD JG9 L7M |
| ID | FETCH-LOGICAL-c466t-f69524a3f8bddb65a2d4bf6b8bf6faa4ef36b3c32ef5fe2e85f305fdba222b693 |
| ISICitedReferencesCount | 138 |
| ISICitedReferencesURI | http://www.webofscience.com/api/gateway?GWVersion=2&SrcApp=Summon&SrcAuth=ProQuest&DestLinkType=CitingArticles&DestApp=WOS_CPL&KeyUT=000353813100034&url=https%3A%2F%2Fcvtisr.summon.serialssolutions.com%2F%23%21%2Fsearch%3Fho%3Df%26include.ft.matches%3Dt%26l%3Dnull%26q%3D |
| ISSN | 0040-6090 |
| IngestDate | Sun Sep 28 10:42:31 EDT 2025 Sat Nov 29 01:54:48 EST 2025 Tue Nov 18 21:31:30 EST 2025 Fri Feb 23 02:14:19 EST 2024 |
| IsPeerReviewed | true |
| IsScholarly | true |
| Keywords | Depolarization Mueller matrix ellipsometry Nanometrology Computational metrology Optical scatterometry Mueller matrix polarimetry Nanostructure Optical metrology |
| Language | English |
| LinkModel | OpenURL |
| MergedId | FETCHMERGED-LOGICAL-c466t-f69524a3f8bddb65a2d4bf6b8bf6faa4ef36b3c32ef5fe2e85f305fdba222b693 |
| Notes | ObjectType-Article-1 SourceType-Scholarly Journals-1 ObjectType-Feature-2 content type line 23 |
| ORCID | 0000-0002-0756-1439 |
| PQID | 1770375478 |
| PQPubID | 23500 |
| PageCount | 10 |
| ParticipantIDs | proquest_miscellaneous_1770375478 crossref_primary_10_1016_j_tsf_2015_02_006 crossref_citationtrail_10_1016_j_tsf_2015_02_006 elsevier_sciencedirect_doi_10_1016_j_tsf_2015_02_006 |
| PublicationCentury | 2000 |
| PublicationDate | 2015-06-01 |
| PublicationDateYYYYMMDD | 2015-06-01 |
| PublicationDate_xml | – month: 06 year: 2015 text: 2015-06-01 day: 01 |
| PublicationDecade | 2010 |
| PublicationTitle | Thin solid films |
| PublicationYear | 2015 |
| Publisher | Elsevier B.V |
| Publisher_xml | – name: Elsevier B.V |
| References | Chen, Liu, Zhang, Zhu (bb0060) 2013; 46 Chen, Liu, Zhang, Jiang (bb0065) 2013; 52 Zhang, Liu, Shi, Tang (bb0050) 2009; 26 De Martino, Kim, Garcia-Caurel, Larde, Drévillon (bb0145) 2003; 28 Liu (bb0130) 2013; 8916 Chen, Liu, Gu, Zhang (bb0185) 2014; 571 Patrick, Germer, Ding, Ro, Richter, Soles (bb0030) 2008; 93 Collins, Koh (bb0160) 1999; 16 Forouhi, Bloomer (bb0200) 1988; 38 Chen, Liu, Zhang, Jiang (bb0105) 2013; 12 Azzam, Bashara (bb0010) 1977 Chen, Zhang, Liu (bb0120) 2013; 103 van de Hulst (bb0180) 1981 Bass (bb0140) 2010 Faruk, Zangooie, Angyal, Watts, Sendelbach, Economikos, Herrera, Wilkins (bb0035) 2011; 24 Zhu, Liu, Chen, Zhang, Jiang (bb0055) 2014; 22 Jellison, Modine (bb0205) 1996; 69 Azzam (bb0155) 1978; 2 Jiang, Chu, Hench, Wack (bb0075) 2008; 6922 Arteaga, Freudenthal, Wang, Kahr (bb0165) 2012; 51 Zhu, Liu, Zhang, Chen, Dong (bb0070) 2013; 12 Moharam, Grann, Pommet, Gaylord (bb0080) 1995; 12 Niu, Jakatdar, Bao, Spanos (bb0015) 2001; 14 Li, Hwu, Liu, Rabello, Liu, Hu (bb0115) 2010; 9 Li (bb0085) 1997; 14 Gil, Bernabeu (bb0175) 1986; 33 Huang, Terry (bb0025) 2004; 455 Kim, Paek, Rabello, Lee, Hu, Liu, Hao, McGahan (bb0110) 2009; 17 Novikova, De Martino, Hatit, Drévillon (bb0095) 2006; 45 Liu, Ma, Chen, Zhang (bb0090) 2012; 51 Palik (bb0210) 1991 bb0190 Huang, Kong, Terry (bb0020) 2001; 78 Novikova, De Martino, Bulkin, Nguyen, Drévillon, Popov, Chumakov (bb0100) 2007; 15 Diebold (bb0040) 2001 Garcia-Caurel, De Martino, Drévillon (bb0150) 2004; 455–456 Raymond (bb0045) 2005; 788 Herzinger, Johs, McGahan, Woollam, Paulson (bb0195) 1998; 83 Fujiwara (bb0170) 2007 Postek, Lyons (bb0005) 2007; 6648 Chen, Liu, Zhang, Jiang, Ma, Sun, Xu (bb0125) 2014; 22 Liu, Chen, Zhang (bb0135) 2014; 60 Faruk (10.1016/j.tsf.2015.02.006_bb0035) 2011; 24 Chen (10.1016/j.tsf.2015.02.006_bb0125) 2014; 22 Diebold (10.1016/j.tsf.2015.02.006_bb0040) 2001 Novikova (10.1016/j.tsf.2015.02.006_bb0095) 2006; 45 Li (10.1016/j.tsf.2015.02.006_bb0085) 1997; 14 Garcia-Caurel (10.1016/j.tsf.2015.02.006_bb0150) 2004; 455–456 Azzam (10.1016/j.tsf.2015.02.006_bb0010) 1977 Azzam (10.1016/j.tsf.2015.02.006_bb0155) 1978; 2 Jiang (10.1016/j.tsf.2015.02.006_bb0075) 2008; 6922 Arteaga (10.1016/j.tsf.2015.02.006_bb0165) 2012; 51 Gil (10.1016/j.tsf.2015.02.006_bb0175) 1986; 33 Chen (10.1016/j.tsf.2015.02.006_bb0185) 2014; 571 De Martino (10.1016/j.tsf.2015.02.006_bb0145) 2003; 28 Liu (10.1016/j.tsf.2015.02.006_bb0090) 2012; 51 Novikova (10.1016/j.tsf.2015.02.006_bb0100) 2007; 15 Jellison (10.1016/j.tsf.2015.02.006_bb0205) 1996; 69 Bass (10.1016/j.tsf.2015.02.006_bb0140) 2010 Forouhi (10.1016/j.tsf.2015.02.006_bb0200) 1988; 38 Moharam (10.1016/j.tsf.2015.02.006_bb0080) 1995; 12 Patrick (10.1016/j.tsf.2015.02.006_bb0030) 2008; 93 Chen (10.1016/j.tsf.2015.02.006_bb0065) 2013; 52 van de Hulst (10.1016/j.tsf.2015.02.006_bb0180) 1981 Herzinger (10.1016/j.tsf.2015.02.006_bb0195) 1998; 83 Chen (10.1016/j.tsf.2015.02.006_bb0120) 2013; 103 Palik (10.1016/j.tsf.2015.02.006_bb0210) 1991 Liu (10.1016/j.tsf.2015.02.006_bb0130) 2013; 8916 Fujiwara (10.1016/j.tsf.2015.02.006_bb0170) 2007 Niu (10.1016/j.tsf.2015.02.006_bb0015) 2001; 14 Zhang (10.1016/j.tsf.2015.02.006_bb0050) 2009; 26 Zhu (10.1016/j.tsf.2015.02.006_bb0055) 2014; 22 Li (10.1016/j.tsf.2015.02.006_bb0115) 2010; 9 Huang (10.1016/j.tsf.2015.02.006_bb0020) 2001; 78 Huang (10.1016/j.tsf.2015.02.006_bb0025) 2004; 455 Chen (10.1016/j.tsf.2015.02.006_bb0105) 2013; 12 Liu (10.1016/j.tsf.2015.02.006_bb0135) 2014; 60 Kim (10.1016/j.tsf.2015.02.006_bb0110) 2009; 17 Zhu (10.1016/j.tsf.2015.02.006_bb0070) 2013; 12 Raymond (10.1016/j.tsf.2015.02.006_bb0045) 2005; 788 Postek (10.1016/j.tsf.2015.02.006_bb0005) 2007; 6648 Chen (10.1016/j.tsf.2015.02.006_bb0060) 2013; 46 Collins (10.1016/j.tsf.2015.02.006_bb0160) 1999; 16 |
| References_xml | – volume: 8916 start-page: 891606 year: 2013 ident: bb0130 article-title: Computational metrology for nanomanufacturing publication-title: Proc. SPIE – volume: 78 start-page: 3893 year: 2001 ident: bb0020 article-title: Normal-incidence spectroscopic ellipsometry for critical dimension monitoring publication-title: Appl. Phys. Lett. – volume: 46 start-page: 2638 year: 2013 ident: bb0060 article-title: Improved measurement accuracy in optical scatterometry using fitting error interpolation based library search publication-title: Measurement – ident: bb0190 article-title: ITRS report, 2013 ed. – volume: 455 start-page: 828 year: 2004 ident: bb0025 article-title: Spectroscopic ellipsometry and reflectometry from gratings (scatterometry) for critical dimension measurement and in situ, real-time process monitoring publication-title: Thin Solid Films – volume: 51 start-page: 6805 year: 2012 ident: bb0165 article-title: Mueller matrix polarimetry with four photoelastic modulators: theory and calibration publication-title: Appl. Opt. – volume: 16 start-page: 1997 year: 1999 ident: bb0160 article-title: Dual rotating-compensator multichannel ellipsometer: instrument design for real-time Mueller matrix spectroscopy of surfaces and films publication-title: J. Opt. Soc. Am. A – volume: 26 start-page: 2327 year: 2009 ident: bb0050 article-title: Improved model-based infrared reflectrometry for measuring deep trench structures publication-title: J. Opt. Soc. Am. A – volume: 51 start-page: 081504 year: 2012 ident: bb0090 article-title: Estimation of the convergence order of rigorous coupled-wave analysis for binary gratings in optical critical dimension metrology publication-title: Opt. Eng. – volume: 93 start-page: 233105 year: 2008 ident: bb0030 article-title: Scatterometry for in situ measurement of pattern flow in nanoimprinted polymers publication-title: Appl. Phys. Lett. – year: 1981 ident: bb0180 article-title: Light Scattering by Small Particles – volume: 28 start-page: 616 year: 2003 ident: bb0145 article-title: Optimized Mueller polarimeter with liquid crystals publication-title: Opt. Lett. – volume: 103 start-page: 151605 year: 2013 ident: bb0120 article-title: Depolarization effects from nanoimprinted grating structures as measured by Mueller matrix polarimetry publication-title: Appl. Phys. Lett. – volume: 455–456 start-page: 120 year: 2004 ident: bb0150 article-title: Spectroscopic Mueller polarimeter based on liquid crystal devices publication-title: Thin Solid Films – volume: 12 start-page: 012004 year: 2013 ident: bb0070 article-title: Identification and reconstruction of diffraction structures in optical scatterometry using support vector machine method publication-title: J. Micro/Nanolith. MEMS MOEMS – volume: 15 start-page: 2033 year: 2007 ident: bb0100 article-title: Metrology of replicated diffractive optics with Mueller polarimetry in conical diffraction publication-title: Opt. Express – year: 2007 ident: bb0170 article-title: Spectroscopic Ellipsometry Principles and Applications – volume: 22 start-page: 15165 year: 2014 ident: bb0125 article-title: Accurate characterization of nanoimprinted resist patterns using Mueller matrix ellipsometry publication-title: Opt. Express – volume: 17 start-page: 21336 year: 2009 ident: bb0110 article-title: Device based in-chip critical dimension and overlay metrology publication-title: Opt. Express – volume: 33 start-page: 185 year: 1986 ident: bb0175 article-title: Depolarization and polarization indices of an optical system publication-title: Opt. Acta (Lond.) – volume: 12 start-page: 033013 year: 2013 ident: bb0105 article-title: Measurement configuration optimization for accurate grating reconstruction by Mueller matrix polarimetry publication-title: J. Micro/Nanolith. MEMS MOEMS – volume: 52 start-page: 6726 year: 2013 ident: bb0065 article-title: Improved measurement accuracy in optical scatterometry using correction-based library search publication-title: Appl. Opt. – volume: 69 start-page: 371 year: 1996 ident: bb0205 article-title: Parameterization of the optical functions of amorphous materials in the interband region publication-title: Appl. Phys. Lett. – volume: 6922 start-page: 69221O year: 2008 ident: bb0075 article-title: Forward solve algorithms for optical critical dimension metrology publication-title: Proc. SPIE – volume: 14 start-page: 2758 year: 1997 ident: bb0085 article-title: New formulation of the Fourier modal method for crossed surface-relief gratings publication-title: J. Opt. Soc. Am. A – year: 2010 ident: bb0140 article-title: Handbook of Optics – volume: 38 start-page: 1865 year: 1988 ident: bb0200 article-title: Optical properties of crystalline semiconductors and dielectrics publication-title: Phys. Rev. B – volume: 571 start-page: 653 year: 2014 ident: bb0185 article-title: Formulation of error propagation and estimation in grating reconstruction by a dual-rotating compensator Mueller matrix polarimeter publication-title: Thin Solid Films – volume: 14 start-page: 97 year: 2001 ident: bb0015 article-title: Specular spectroscopic scatterometry publication-title: IEEE Trans. Semicond. Manuf. – volume: 24 start-page: 499 year: 2011 ident: bb0035 article-title: Enabling scatterometry as an in-line measurement technique for 32 publication-title: IEEE Trans. Semicond. Manuf. – volume: 60 start-page: 237 year: 2014 ident: bb0135 article-title: Mueller matrix polarimetry: a powerful tool for nanostructure metrology publication-title: ECS Trans. – volume: 788 start-page: 394 year: 2005 ident: bb0045 article-title: Overview of scatterometry applications in high volume silicon manufacturing publication-title: AIP Conf. Proc. – year: 1977 ident: bb0010 article-title: Ellipsometry and Polarized Light – volume: 22 start-page: 22031 year: 2014 ident: bb0055 article-title: Robust solution to the inverse problem in optical scatterometry publication-title: Opt. Express – year: 2001 ident: bb0040 article-title: Handbook of Silicon Semiconductor Metrology – volume: 45 start-page: 3688 year: 2006 ident: bb0095 article-title: Application of Mueller polarimetry in conical diffraction for critical dimension measurements in microelectronics publication-title: Appl. Opt. – volume: 83 start-page: 3323 year: 1998 ident: bb0195 article-title: Ellipsometric determination of optical constants for silicon and thermally grown silicon dioxide via a multi-sample, multi-wavelength, multi-angle investigation publication-title: J. Appl. Phys. – volume: 6648 start-page: 664802 year: 2007 ident: bb0005 article-title: Instrumentation, metrology, and standards: key elements for the future of nanomanufacturing publication-title: Proc. SPIE – volume: 9 start-page: 041305 year: 2010 ident: bb0115 article-title: Mueller matrix measurement of asymmetric gratings publication-title: J. Micro/Nanolith. MEMS MOEMS – volume: 2 start-page: 148 year: 1978 ident: bb0155 article-title: Photopolarimeter measurement of the Mueller matrix by Fourier analysis of a single detected signal publication-title: Opt. Lett. – year: 1991 ident: bb0210 article-title: Handbook of Optical Constant of Solids – volume: 12 start-page: 1068 year: 1995 ident: bb0080 article-title: Formulation for stable and efficient implementation of the rigorous coupled-wave analysis of binary gratings publication-title: J. Opt. Soc. Am. A – year: 1977 ident: 10.1016/j.tsf.2015.02.006_bb0010 – volume: 78 start-page: 3893 year: 2001 ident: 10.1016/j.tsf.2015.02.006_bb0020 article-title: Normal-incidence spectroscopic ellipsometry for critical dimension monitoring publication-title: Appl. Phys. Lett. doi: 10.1063/1.1378807 – volume: 788 start-page: 394 year: 2005 ident: 10.1016/j.tsf.2015.02.006_bb0045 article-title: Overview of scatterometry applications in high volume silicon manufacturing publication-title: AIP Conf. Proc. doi: 10.1063/1.2062993 – volume: 22 start-page: 15165 year: 2014 ident: 10.1016/j.tsf.2015.02.006_bb0125 article-title: Accurate characterization of nanoimprinted resist patterns using Mueller matrix ellipsometry publication-title: Opt. Express doi: 10.1364/OE.22.015165 – volume: 455 start-page: 828 year: 2004 ident: 10.1016/j.tsf.2015.02.006_bb0025 article-title: Spectroscopic ellipsometry and reflectometry from gratings (scatterometry) for critical dimension measurement and in situ, real-time process monitoring publication-title: Thin Solid Films doi: 10.1016/j.tsf.2004.04.010 – volume: 12 start-page: 1068 year: 1995 ident: 10.1016/j.tsf.2015.02.006_bb0080 article-title: Formulation for stable and efficient implementation of the rigorous coupled-wave analysis of binary gratings publication-title: J. Opt. Soc. Am. A doi: 10.1364/JOSAA.12.001068 – volume: 52 start-page: 6726 year: 2013 ident: 10.1016/j.tsf.2015.02.006_bb0065 article-title: Improved measurement accuracy in optical scatterometry using correction-based library search publication-title: Appl. Opt. doi: 10.1364/AO.52.006726 – volume: 455–456 start-page: 120 year: 2004 ident: 10.1016/j.tsf.2015.02.006_bb0150 article-title: Spectroscopic Mueller polarimeter based on liquid crystal devices publication-title: Thin Solid Films doi: 10.1016/j.tsf.2003.12.056 – volume: 45 start-page: 3688 year: 2006 ident: 10.1016/j.tsf.2015.02.006_bb0095 article-title: Application of Mueller polarimetry in conical diffraction for critical dimension measurements in microelectronics publication-title: Appl. Opt. doi: 10.1364/AO.45.003688 – volume: 6648 start-page: 664802 year: 2007 ident: 10.1016/j.tsf.2015.02.006_bb0005 article-title: Instrumentation, metrology, and standards: key elements for the future of nanomanufacturing publication-title: Proc. SPIE doi: 10.1117/12.730855 – year: 2001 ident: 10.1016/j.tsf.2015.02.006_bb0040 – volume: 103 start-page: 151605 year: 2013 ident: 10.1016/j.tsf.2015.02.006_bb0120 article-title: Depolarization effects from nanoimprinted grating structures as measured by Mueller matrix polarimetry publication-title: Appl. Phys. Lett. doi: 10.1063/1.4824760 – year: 1991 ident: 10.1016/j.tsf.2015.02.006_bb0210 – volume: 8916 start-page: 891606 year: 2013 ident: 10.1016/j.tsf.2015.02.006_bb0130 article-title: Computational metrology for nanomanufacturing publication-title: Proc. SPIE doi: 10.1117/12.2035549 – volume: 51 start-page: 6805 year: 2012 ident: 10.1016/j.tsf.2015.02.006_bb0165 article-title: Mueller matrix polarimetry with four photoelastic modulators: theory and calibration publication-title: Appl. Opt. doi: 10.1364/AO.51.006805 – volume: 69 start-page: 371 year: 1996 ident: 10.1016/j.tsf.2015.02.006_bb0205 article-title: Parameterization of the optical functions of amorphous materials in the interband region publication-title: Appl. Phys. Lett. doi: 10.1063/1.118064 – volume: 14 start-page: 97 year: 2001 ident: 10.1016/j.tsf.2015.02.006_bb0015 article-title: Specular spectroscopic scatterometry publication-title: IEEE Trans. Semicond. Manuf. doi: 10.1109/66.920722 – volume: 22 start-page: 22031 year: 2014 ident: 10.1016/j.tsf.2015.02.006_bb0055 article-title: Robust solution to the inverse problem in optical scatterometry publication-title: Opt. Express doi: 10.1364/OE.22.022031 – volume: 12 start-page: 033013 year: 2013 ident: 10.1016/j.tsf.2015.02.006_bb0105 article-title: Measurement configuration optimization for accurate grating reconstruction by Mueller matrix polarimetry publication-title: J. Micro/Nanolith. MEMS MOEMS doi: 10.1117/1.JMM.12.3.033013 – year: 2010 ident: 10.1016/j.tsf.2015.02.006_bb0140 – volume: 16 start-page: 1997 year: 1999 ident: 10.1016/j.tsf.2015.02.006_bb0160 article-title: Dual rotating-compensator multichannel ellipsometer: instrument design for real-time Mueller matrix spectroscopy of surfaces and films publication-title: J. Opt. Soc. Am. A doi: 10.1364/JOSAA.16.001997 – volume: 51 start-page: 081504 year: 2012 ident: 10.1016/j.tsf.2015.02.006_bb0090 article-title: Estimation of the convergence order of rigorous coupled-wave analysis for binary gratings in optical critical dimension metrology publication-title: Opt. Eng. doi: 10.1117/1.OE.51.8.081504 – volume: 83 start-page: 3323 year: 1998 ident: 10.1016/j.tsf.2015.02.006_bb0195 article-title: Ellipsometric determination of optical constants for silicon and thermally grown silicon dioxide via a multi-sample, multi-wavelength, multi-angle investigation publication-title: J. Appl. Phys. doi: 10.1063/1.367101 – year: 2007 ident: 10.1016/j.tsf.2015.02.006_bb0170 – volume: 12 start-page: 012004 year: 2013 ident: 10.1016/j.tsf.2015.02.006_bb0070 article-title: Identification and reconstruction of diffraction structures in optical scatterometry using support vector machine method publication-title: J. Micro/Nanolith. MEMS MOEMS doi: 10.1117/1.JMM.12.1.013004 – volume: 38 start-page: 1865 year: 1988 ident: 10.1016/j.tsf.2015.02.006_bb0200 article-title: Optical properties of crystalline semiconductors and dielectrics publication-title: Phys. Rev. B doi: 10.1103/PhysRevB.38.1865 – volume: 46 start-page: 2638 year: 2013 ident: 10.1016/j.tsf.2015.02.006_bb0060 article-title: Improved measurement accuracy in optical scatterometry using fitting error interpolation based library search publication-title: Measurement doi: 10.1016/j.measurement.2013.04.080 – volume: 60 start-page: 237 year: 2014 ident: 10.1016/j.tsf.2015.02.006_bb0135 article-title: Mueller matrix polarimetry: a powerful tool for nanostructure metrology publication-title: ECS Trans. doi: 10.1149/06001.0237ecst – volume: 93 start-page: 233105 year: 2008 ident: 10.1016/j.tsf.2015.02.006_bb0030 article-title: Scatterometry for in situ measurement of pattern flow in nanoimprinted polymers publication-title: Appl. Phys. Lett. doi: 10.1063/1.3046117 – volume: 28 start-page: 616 year: 2003 ident: 10.1016/j.tsf.2015.02.006_bb0145 article-title: Optimized Mueller polarimeter with liquid crystals publication-title: Opt. Lett. doi: 10.1364/OL.28.000616 – volume: 2 start-page: 148 year: 1978 ident: 10.1016/j.tsf.2015.02.006_bb0155 article-title: Photopolarimeter measurement of the Mueller matrix by Fourier analysis of a single detected signal publication-title: Opt. Lett. doi: 10.1364/OL.2.000148 – volume: 26 start-page: 2327 year: 2009 ident: 10.1016/j.tsf.2015.02.006_bb0050 article-title: Improved model-based infrared reflectrometry for measuring deep trench structures publication-title: J. Opt. Soc. Am. A doi: 10.1364/JOSAA.26.002327 – volume: 14 start-page: 2758 year: 1997 ident: 10.1016/j.tsf.2015.02.006_bb0085 article-title: New formulation of the Fourier modal method for crossed surface-relief gratings publication-title: J. Opt. Soc. Am. A doi: 10.1364/JOSAA.14.002758 – volume: 33 start-page: 185 year: 1986 ident: 10.1016/j.tsf.2015.02.006_bb0175 article-title: Depolarization and polarization indices of an optical system publication-title: Opt. Acta (Lond.) doi: 10.1080/713821924 – year: 1981 ident: 10.1016/j.tsf.2015.02.006_bb0180 – volume: 15 start-page: 2033 year: 2007 ident: 10.1016/j.tsf.2015.02.006_bb0100 article-title: Metrology of replicated diffractive optics with Mueller polarimetry in conical diffraction publication-title: Opt. Express doi: 10.1364/OE.15.002033 – volume: 571 start-page: 653 year: 2014 ident: 10.1016/j.tsf.2015.02.006_bb0185 article-title: Formulation of error propagation and estimation in grating reconstruction by a dual-rotating compensator Mueller matrix polarimeter publication-title: Thin Solid Films doi: 10.1016/j.tsf.2014.01.049 – volume: 24 start-page: 499 year: 2011 ident: 10.1016/j.tsf.2015.02.006_bb0035 article-title: Enabling scatterometry as an in-line measurement technique for 32nm BEOL application publication-title: IEEE Trans. Semicond. Manuf. doi: 10.1109/TSM.2011.2158862 – volume: 6922 start-page: 69221O year: 2008 ident: 10.1016/j.tsf.2015.02.006_bb0075 article-title: Forward solve algorithms for optical critical dimension metrology publication-title: Proc. SPIE doi: 10.1117/12.773003 – volume: 17 start-page: 21336 year: 2009 ident: 10.1016/j.tsf.2015.02.006_bb0110 article-title: Device based in-chip critical dimension and overlay metrology publication-title: Opt. Express doi: 10.1364/OE.17.021336 – volume: 9 start-page: 041305 year: 2010 ident: 10.1016/j.tsf.2015.02.006_bb0115 article-title: Mueller matrix measurement of asymmetric gratings publication-title: J. Micro/Nanolith. MEMS MOEMS doi: 10.1117/1.3514708 |
| SSID | ssj0001223 |
| Score | 2.5169442 |
| SecondaryResourceType | review_article |
| Snippet | Ellipsometric scatterometry has gained wide industrial applications in semiconductor manufacturing after ten years of development. Among the various types of... |
| SourceID | proquest crossref elsevier |
| SourceType | Aggregation Database Enrichment Source Index Database Publisher |
| StartPage | 176 |
| SubjectTerms | Computation Computational metrology Depolarization Ellipsometers Ellipsometry Instrumentation Metrology Mueller matrix ellipsometry Mueller matrix polarimetry Nanometrology Nanostructure Optical metrology Optical scatterometry Semiconductors Thin films |
| Title | Development of a broadband Mueller matrix ellipsometer as a powerful tool for nanostructure metrology |
| URI | https://dx.doi.org/10.1016/j.tsf.2015.02.006 https://www.proquest.com/docview/1770375478 |
| Volume | 584 |
| WOSCitedRecordID | wos000353813100034&url=https%3A%2F%2Fcvtisr.summon.serialssolutions.com%2F%23%21%2Fsearch%3Fho%3Df%26include.ft.matches%3Dt%26l%3Dnull%26q%3D |
| hasFullText | 1 |
| inHoldings | 1 |
| isFullTextHit | |
| isPrint | |
| journalDatabaseRights | – providerCode: PRVESC databaseName: Elsevier SD Freedom Collection Journals 2021 customDbUrl: eissn: 1879-2731 dateEnd: 99991231 omitProxy: false ssIdentifier: ssj0001223 issn: 0040-6090 databaseCode: AIEXJ dateStart: 19950101 isFulltext: true titleUrlDefault: https://www.sciencedirect.com providerName: Elsevier |
| link | http://cvtisr.summon.serialssolutions.com/2.0.0/link/0/eLvHCXMwtV1Lj9MwELagCxIcECwglpeMhDhQBSXOyzmuqq4AVYVDF-Vm2Ym9m4ompWmg_Htm8mrYhdVy4GJVltMmnq_2ZObzfIS8NspRiUp9y2Bww5OKWRFjieVwaXPoC9O6qM-XWTif8ziOPrck9rKWEwjznO920fq_mhr6wNh4dPYfzN1_KXTAZzA6tGB2aK9l-AENqDn8qDaFTFVNqKgwTL8Zr7Au_26s6zxAsUJGDOrNyPEaNdOQtbzF0pzIQMxlXjQ1ZjHTAEM3-zj8skNalo_hmbIUqzyteid9llV1bPU8-1ntMThpj4PEWXVWFZfi1pNzGPtDZ8NohOPvWVPdCovHCexGArRbYX3uDdZIJwwG263TKPZcWsmboMLy3basC636TWXVP1TNnn8SJ6ezmVhM48Wb9TcLBcUw8d6qq9wkByz0Iz4iB8cfpvHHfpt2GOsplXjDXcq7Jv9d-NW_OS0Xtu_aJ1ncJ_falwl63IDgAbmh80Nyd1Bi8pDcrim-SfmQ6AEwaGGopD0waAsM2gCDDoFBZQlDO2BQBAYFYNDfgEF7YDwipyfTxeS91YpsWIkXBFvLBJHPPOkartJUBb5kqadMoDg0RkpPGzdQbuIybXyjmea-gS3CwN2BZ6mCyH1MRnmR6yeEBnYaMRmZSOoQtgYeKenxREp4Z01RyP6I2N0siqStQI9CKF9FRzVcCph4gRMvbCZg4o_I2_6SdVN-5arBXmca0fqPjV8oAFRXXfaqM6OAtRUTZjLXRVUKJwxrieiQP73GmGfkzv4f8ZyMwAT6BbmVfN9m5eZlC79fOX-hMw |
| linkProvider | Elsevier |
| openUrl | ctx_ver=Z39.88-2004&ctx_enc=info%3Aofi%2Fenc%3AUTF-8&rfr_id=info%3Asid%2Fsummon.serialssolutions.com&rft_val_fmt=info%3Aofi%2Ffmt%3Akev%3Amtx%3Ajournal&rft.genre=article&rft.atitle=Development+of+a+broadband+Mueller+matrix+ellipsometer+as+a+powerful+tool+for+nanostructure+metrology&rft.jtitle=Thin+solid+films&rft.au=Liu%2C+Shiyuan&rft.au=Chen%2C+Xiuguo&rft.au=Zhang%2C+Chuanwei&rft.date=2015-06-01&rft.issn=0040-6090&rft.volume=584&rft.spage=176&rft.epage=185&rft_id=info:doi/10.1016%2Fj.tsf.2015.02.006&rft.externalDBID=NO_FULL_TEXT |
| thumbnail_l | http://covers-cdn.summon.serialssolutions.com/index.aspx?isbn=/lc.gif&issn=0040-6090&client=summon |
| thumbnail_m | http://covers-cdn.summon.serialssolutions.com/index.aspx?isbn=/mc.gif&issn=0040-6090&client=summon |
| thumbnail_s | http://covers-cdn.summon.serialssolutions.com/index.aspx?isbn=/sc.gif&issn=0040-6090&client=summon |