Influence of Al Content on the Properties of MgO Grown by Reactive Magnetron Sputtering

In the present work, reactive magnetron sputtering in DC mode was used to grow complex oxide thin films, starting from two separate pure metal targets. A series of coatings was produced with a stoichiometry of the film ranging from MgO, over MgxAlyOz to Al2O3. The surface energy, crystallinity, hard...

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Vydané v:Plasma processes and polymers Ročník 6; číslo S1; s. S751 - S754
Hlavní autori: Saraiva, Marta, Chen, Hong, Leroy, Wouter P., Mahieu, Stijn, Jehanathan, Neerushana, Lebedev, Oleg, Georgieva, Violeta, Persoons, Rosita, Depla, Diederik
Médium: Journal Article
Jazyk:English
Vydavateľské údaje: Weinheim WILEY-VCH Verlag 01.06.2009
WILEY‐VCH Verlag
Predmet:
Aluminum oxide
Crystallinity
Magnesium
Magnesium oxide
Magnetron sputtering
Oxides
sputtering
Stoichiometry
surface energy
Surface roughness
thin films
X-ray
ISSN:1612-8850, 1612-8869
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Shrnutí:In the present work, reactive magnetron sputtering in DC mode was used to grow complex oxide thin films, starting from two separate pure metal targets. A series of coatings was produced with a stoichiometry of the film ranging from MgO, over MgxAlyOz to Al2O3. The surface energy, crystallinity, hardness, refractive index, and surface roughness were investigated. A relationship between all properties studied and the Mg content of the samples was found. A critical compositional region for the Mg–Al–O system where all properties exhibit a change was noticed.
Bibliografia:ark:/67375/WNG-DPHD0VTF-0
ArticleID:PPAP200931809
Research Foundation-Flanders (FWO)
istex:A5769D168A59C5961F08DFF9D9BA634FA6823118
ObjectType-Article-2
SourceType-Scholarly Journals-1
ObjectType-Feature-1
content type line 23
ISSN:1612-8850
1612-8869
DOI:10.1002/ppap.200931809