Influence of Al Content on the Properties of MgO Grown by Reactive Magnetron Sputtering

In the present work, reactive magnetron sputtering in DC mode was used to grow complex oxide thin films, starting from two separate pure metal targets. A series of coatings was produced with a stoichiometry of the film ranging from MgO, over MgxAlyOz to Al2O3. The surface energy, crystallinity, hard...

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Bibliographic Details

Published in:	Plasma processes and polymers Vol. 6; no. S1; pp. S751 - S754
Main Authors:	Saraiva, Marta, Chen, Hong, Leroy, Wouter P., Mahieu, Stijn, Jehanathan, Neerushana, Lebedev, Oleg, Georgieva, Violeta, Persoons, Rosita, Depla, Diederik
Format:	Journal Article
Language:	English
Published:	Weinheim WILEY-VCH Verlag 01.06.2009 WILEY‐VCH Verlag
Subjects:	Aluminum oxide Crystallinity Magnesium Magnesium oxide Magnetron sputtering Oxides sputtering Stoichiometry surface energy Surface roughness thin films X-ray
ISSN:	1612-8850, 1612-8869
Online Access:	Get full text
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