5 GHz laterally-excited bulk-wave resonators (XBARs) based on thin platelets of lithium niobate

In a free-standing 400-nm-thick platelet of crystalline ZY-LiNbO3, narrow electrodes (500 nm) placed periodically with a pitch of a few microns can eXcite standing shear-wave bulk acoustic resonances (XBARs), by utilising lateral electric fields oriented parallel to the crystalline Y-axis and parall...

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Vydáno v:	Electronics letters Ročník 55; číslo 2; s. 98 - 100
Hlavní autoři:	Plessky, V, Yandrapalli, S, Turner, P.J, Villanueva, L.G, Koskela, J, Hammond, R.B
Médium:	Journal Article
Jazyk:	angličtina
Vydáno:	The Institution of Engineering and Technology 24.01.2019
Témata:	4th generation mobile phones 5th generation mobile phones acoustic resonators bulk acoustic wave devices crystal resonators crystalline Y‐axis electrodes free‐standing platelet frequency 3.0 GHz to 6.0 GHz frequency 5.0 GHz high frequency filter lateral electric fields laterally‐excited bulk‐wave resonators LiNbO3 lithium compounds lithium niobate low‐loss filters MEMS process micromechanical devices microwave filters microwave resonators Microwave technology narrow electrodes optical photolithography photolithography piezoelectric coupling quality‐factors Q‐factor resonance frequency resonance Q‐factor resonance‐antiresonance frequency spacing RF filters shear‐wave bulk acoustic resonances size 400 nm size 500.0 nm wide band filters XBAR Q-factor 4th generation mobile phones MEMS process resonance frequency micromechanical devices size 500.0 nm lithium niobate quality-factors low-loss filters laterally-excited bulk-wave resonators high frequency filter 5th generation mobile phones bulk acoustic wave devices frequency 5.0 GHz crystal resonators crystalline Y-axis resonance-antiresonance frequency spacing electrodes microwave resonators free-standing platelet piezoelectric coupling size 400 nm acoustic resonators lateral electric fields LiNbO3 lithium compounds resonance Q-factor photolithography narrow electrodes XBAR frequency 3.0 GHz to 6.0 GHz wide band filters optical photolithography microwave filters shear-wave bulk acoustic resonances RF filters
ISSN:	0013-5194, 1350-911X, 1350-911X
On-line přístup:	Získat plný text
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