Physics and technology of magnetron sputtering discharges

Magnetron sputtering deposition has become the most widely used technique for deposition of both metallic and compound thin films and is utilized in numerous industrial applications. There has been a continuous development of the magnetron sputtering technology to improve target utilization, increas...

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Vydané v:	Plasma sources science & technology Ročník 29; číslo 11
Hlavný autor:	Gudmundsson, J T
Médium:	Journal Article
Jazyk:	English
Vydavateľské údaje:	IOP Publishing 01.11.2020
Predmet:	dc diode sputtering dc discharge E×B discharge magnetron sputtering discharge physical vapor deposition reactive sputtering sputtering
ISSN:	0963-0252, 1361-6595
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