Factors influencing ion energy distributions in pulsed inductively coupled argon plasmas

Pulsed plasmas are important for the fabrication of nanoscale features. Source biasing is generally associated with the control of the ion to radical flux ratio; how the ion energy distribution function varies over a pulse period is also important. In this paper, we experimentally investigate the ef...

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Bibliographic Details

Published in:	Journal of physics. D, Applied physics Vol. 53; no. 33
Main Authors:	Chen, Zhiying, Longo, Roberto C, Hummel, Michael, Carruth, Megan, Blakeney, Joel, Ventzek, Peter, Ranjan, Alok
Format:	Journal Article
Language:	English
Published:	IOP Publishing 12.08.2020
Subjects:	fluid plasma simulation ion energy distribution pulse transient pulsed plasma
ISSN:	0022-3727, 1361-6463
Online Access:	Get full text
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