Factors influencing ion energy distributions in pulsed inductively coupled argon plasmas

Pulsed plasmas are important for the fabrication of nanoscale features. Source biasing is generally associated with the control of the ion to radical flux ratio; how the ion energy distribution function varies over a pulse period is also important. In this paper, we experimentally investigate the ef...

Celý popis

Uloženo v:
Podrobná bibliografie
Vydáno v:Journal of physics. D, Applied physics Ročník 53; číslo 33
Hlavní autoři: Chen, Zhiying, Longo, Roberto C, Hummel, Michael, Carruth, Megan, Blakeney, Joel, Ventzek, Peter, Ranjan, Alok
Médium: Journal Article
Jazyk:angličtina
Vydáno: IOP Publishing 12.08.2020
Témata:
fluid plasma simulation
ion energy distribution
pulse transient
pulsed plasma
ISSN:0022-3727, 1361-6463
On-line přístup:Získat plný text
Tagy: Přidat tag
Žádné tagy, Buďte první, kdo vytvoří štítek k tomuto záznamu!
Abstract Pulsed plasmas are important for the fabrication of nanoscale features. Source biasing is generally associated with the control of the ion to radical flux ratio; how the ion energy distribution function varies over a pulse period is also important. In this paper, we experimentally investigate the effect of pulse transients (i.e. power on to power off phases) on ion energy distributions during different RF source power duty cycles (99%-20%) in a compact inductively coupled argon plasma with time average RF power of 150 W at a frequency of 13.56 MHz and pressure of 20 mT (2.67 Pa). The ion energy distributions were measured by retarding field energy analyzer. With the decrease of RF power duty cycle, the increase of ion energy and energy spread is observed and ion energy distribution changes from single peaked to bi-modal. The effect of RF power duty cycle on the ion energy transition is discussed. Fluid and test particle simulations are used to illustrate the origin of features in the measured ion energy distributions. Capacitive coupling from the RF induction coils is highlighted as the origin for important features in the ion energy distributions.
AbstractList Pulsed plasmas are important for the fabrication of nanoscale features. Source biasing is generally associated with the control of the ion to radical flux ratio; how the ion energy distribution function varies over a pulse period is also important. In this paper, we experimentally investigate the effect of pulse transients (i.e. power on to power off phases) on ion energy distributions during different RF source power duty cycles (99%-20%) in a compact inductively coupled argon plasma with time average RF power of 150 W at a frequency of 13.56 MHz and pressure of 20 mT (2.67 Pa). The ion energy distributions were measured by retarding field energy analyzer. With the decrease of RF power duty cycle, the increase of ion energy and energy spread is observed and ion energy distribution changes from single peaked to bi-modal. The effect of RF power duty cycle on the ion energy transition is discussed. Fluid and test particle simulations are used to illustrate the origin of features in the measured ion energy distributions. Capacitive coupling from the RF induction coils is highlighted as the origin for important features in the ion energy distributions.
Author Hummel, Michael
Blakeney, Joel
Chen, Zhiying
Longo, Roberto C
Carruth, Megan
Ventzek, Peter
Ranjan, Alok
Author_xml – sequence: 1
  givenname: Zhiying
  surname: Chen
  fullname: Chen, Zhiying
  email: zhiying.chen@us.tel.com
  organization: Tokyo Electron America , 2400 Grove Blvd., Austin, TX 78741, United States of America
– sequence: 2
  givenname: Roberto C
  orcidid: 0000-0003-4353-841X
  surname: Longo
  fullname: Longo, Roberto C
  organization: Tokyo Electron America , 2400 Grove Blvd., Austin, TX 78741, United States of America
– sequence: 3
  givenname: Michael
  surname: Hummel
  fullname: Hummel, Michael
  organization: Tokyo Electron America , 2400 Grove Blvd., Austin, TX 78741, United States of America
– sequence: 4
  givenname: Megan
  orcidid: 0000-0002-2368-325X
  surname: Carruth
  fullname: Carruth, Megan
  organization: Tokyo Electron America , 2400 Grove Blvd., Austin, TX 78741, United States of America
– sequence: 5
  givenname: Joel
  surname: Blakeney
  fullname: Blakeney, Joel
  organization: Tokyo Electron America , 2400 Grove Blvd., Austin, TX 78741, United States of America
– sequence: 6
  givenname: Peter
  orcidid: 0000-0003-0141-2843
  surname: Ventzek
  fullname: Ventzek, Peter
  organization: Tokyo Electron America , 2400 Grove Blvd., Austin, TX 78741, United States of America
– sequence: 7
  givenname: Alok
  surname: Ranjan
  fullname: Ranjan, Alok
  organization: Tokyo Electron Miyagi Ltd , 1 Techno-Hills, Taiwa-cho, Kurokawa-gun, Miyagi, 9813629, Japan
BookMark eNptkE1Lw0AQhhepYFu9e8zJk7GzX8nmKMWqUPCi4G3Zz7IlbkI2Efrv3VDxJCzM8vLMDPOs0CJ20SF0i-EBgxAbTCtcVqyiG6WFBnGBln_RAi0BCClpTeortErpCAC8EniJPnfKjN2QihB9O7loQjwUoYuFi244nAob0jgEPY05m6Gin9rkbP7ZyYzh27WnwnRT3-ZMDYfc2Lcqfal0jS69yujNb12jj93T-_al3L89v24f96VhuBlLTRvtgTnOvW244rX2wlIHBPsKW2VAUfCYVcR4VjeCK6yYY1U-UNeONoKu0d15buh6eeymIeZt0kpOJZ0fJ0Bkb30G7_8BMchZn5xdydmVPOujP5w3ZfA
CODEN JPAPBE
CitedBy_id crossref_primary_10_1016_j_apsusc_2025_164467
crossref_primary_10_1088_1361_6595_abf71b
ContentType Journal Article
Copyright 2020 The Author(s). Published by IOP Publishing Ltd
Copyright_xml – notice: 2020 The Author(s). Published by IOP Publishing Ltd
DBID O3W
TSCCA
DOI 10.1088/1361-6463/ab8b08
DatabaseName IOP Publishing Free Content
IOPscience (Open Access)
DatabaseTitleList
Database_xml – sequence: 1
  dbid: O3W
  name: Institute of Physics Open Access Journal Titles
  url: http://iopscience.iop.org/
  sourceTypes:
    Enrichment Source
    Publisher
DeliveryMethod fulltext_linktorsrc
Discipline Engineering
Physics
DocumentTitleAlternate Factors influencing ion energy distributions in pulsed inductively coupled argon plasmas
EISSN 1361-6463
ExternalDocumentID dab8b08
GroupedDBID -ET
-~X
1JI
4.4
5B3
5GY
5PX
5VS
5ZH
6TJ
7.M
7.Q
AAGCD
AAGID
AAJIO
AAJKP
AATNI
ABCXL
ABHWH
ABJNI
ABQJV
ABVAM
ACAFW
ACGFO
ACGFS
ACHIP
ACNCT
AEFHF
AFFNX
AFYNE
AKPSB
ALMA_UNASSIGNED_HOLDINGS
AOAED
ASPBG
ATQHT
AVWKF
AZFZN
CBCFC
CEBXE
CJUJL
CRLBU
CS3
EBS
EDWGO
EMSAF
EPQRW
EQZZN
F5P
HAK
IHE
IJHAN
IOP
IZVLO
KOT
LAP
M45
N5L
N9A
O3W
P2P
PJBAE
RIN
RKQ
RNS
RO9
ROL
RPA
SY9
TAE
TN5
TSCCA
UCJ
W28
WH7
XPP
XSW
YQT
ZMT
ID FETCH-LOGICAL-c419t-b39bf04e55fd95a57bf8d3e021f61dac0a30f1462cf47985a1a4e46b08b7e3983
IEDL.DBID O3W
ISICitedReferencesCount 4
ISICitedReferencesURI http://www.webofscience.com/api/gateway?GWVersion=2&SrcApp=Summon&SrcAuth=ProQuest&DestLinkType=CitingArticles&DestApp=WOS_CPL&KeyUT=000540825800001&url=https%3A%2F%2Fcvtisr.summon.serialssolutions.com%2F%23%21%2Fsearch%3Fho%3Df%26include.ft.matches%3Dt%26l%3Dnull%26q%3D
ISSN 0022-3727
IngestDate Wed Aug 21 03:34:39 EDT 2024
Thu Jan 07 15:20:51 EST 2021
IsDoiOpenAccess true
IsOpenAccess true
IsPeerReviewed true
IsScholarly true
Issue 33
Language English
License Original content from this work may be used under the terms of the Creative Commons Attribution 3.0 license. Any further distribution of this work must maintain attribution to the author(s) and the title of the work, journal citation and DOI.
LinkModel DirectLink
MergedId FETCHMERGED-LOGICAL-c419t-b39bf04e55fd95a57bf8d3e021f61dac0a30f1462cf47985a1a4e46b08b7e3983
Notes JPhysD-123770.R2
ORCID 0000-0003-0141-2843
0000-0003-4353-841X
0000-0002-2368-325X
OpenAccessLink https://iopscience.iop.org/article/10.1088/1361-6463/ab8b08
PageCount 7
ParticipantIDs iop_journals_10_1088_1361_6463_ab8b08
PublicationCentury 2000
PublicationDate 2020-08-12
PublicationDateYYYYMMDD 2020-08-12
PublicationDate_xml – month: 08
  year: 2020
  text: 2020-08-12
  day: 12
PublicationDecade 2020
PublicationTitle Journal of physics. D, Applied physics
PublicationTitleAbbrev JPhysD
PublicationTitleAlternate J. Phys. D: Appl. Phys
PublicationYear 2020
Publisher IOP Publishing
Publisher_xml – name: IOP Publishing
SSID ssj0005681
Score 2.360381
Snippet Pulsed plasmas are important for the fabrication of nanoscale features. Source biasing is generally associated with the control of the ion to radical flux...
SourceID iop
SourceType Enrichment Source
Publisher
SubjectTerms fluid plasma simulation
ion energy distribution
pulse transient
pulsed plasma
Title Factors influencing ion energy distributions in pulsed inductively coupled argon plasmas
URI https://iopscience.iop.org/article/10.1088/1361-6463/ab8b08
Volume 53
WOSCitedRecordID wos000540825800001&url=https%3A%2F%2Fcvtisr.summon.serialssolutions.com%2F%23%21%2Fsearch%3Fho%3Df%26include.ft.matches%3Dt%26l%3Dnull%26q%3D
hasFullText 1
inHoldings 1
isFullTextHit
isPrint
link http://cvtisr.summon.serialssolutions.com/2.0.0/link/0/eLvHCXMwpV1LS8NAEF5KVdCDj6pYnznoMTb73uBJxOJBqgcfvYV9RQq1DX0I_ntnk1AreBCEHIbsZDc7u5mZsDPfIHROiLKeJC6W2KuYWaBSK2XMNJeJt07jMtri5V72eqrfTx8b6GqRCzMuatV_CWQFFFyJsA6IUx1MBY4FE7SjjTIh0XeFKi7CJn-gr9_xHULhBVQ4WOn6jPK3HsCuwGBLdqW79a832kabtTsZXVesO6jhRy20sQQy2EJrZZCnne6ifrcqrhMN6sok0B7BukS-TACMXADRretfBaaomIPhdEAFUFhQi8PPyI7nxRDu6ckbPFiA7_2up3vouXv7dHMX15UVYstwOosNTU2eMM957lIOy2Jy5agHe58L7LRNNE1y0KHE5kymimusmWcCpmakp6mi-6g5Go_8AYocNkZoDn6m1IxxZYCbpYxI7oS3krfRBYgtq7-MaVYeeiuVBZllQWZZJbM2OvvB5zJOMxouThKSFS4__GNPR2idhJ_igFtLjlFzNpn7E7RqP2aD6eS03CRfQF-84g
linkProvider IOP Publishing
linkToPdf http://cvtisr.summon.serialssolutions.com/2.0.0/link/0/eLvHCXMwpV1LT9wwEB7xKBUcaAtF5Z0DPaYbv2LniIAVCLTl0NK9WX4FIcFutA-k_nvGiQVU6gEJKYdRMnGSz4lnIo-_D-CIUuUCLXwuSVA5d2hVTsqcGyGL4LwhbbXFzZUcDNRwWF0nndN2Lcy4SUP_DzQ7ouAOwlQQp3qElSQvecl6xipbqF7j60VYFkywqN3wk_15qfEoFXmmC8dIneYp_9cKxha84KvY0v_07rv6DOsprcyOO_cvsBBGG7D2imxwA1baYk833YRhvxPZye6SQgkez7B_stAuBMx8JNNNOljRKWvmGEA9WpEcFofH-7-ZG8-be9xnJrd4YoM5-IOZfoXf_bNfJ-d5UljIHSfVLLessnXBgxC1rwR2j62VZwHjfl0Sb1xhWFHjWEpdzWWlhCGGB17i41kZWKXYFiyNxqPwDTJPrC2NwHxTGs6FsujNK06l8GVwUmzDd4ROpy9kqtvJb6V0xE1H3HSH2zYc_uPntWCaxU3QgmpEdeeNLR3Cx-vTvr66GFzuwiqN_8mRypbuwdJsMg_78ME9zu6mk4P2nXkCe-3CQQ
openUrl ctx_ver=Z39.88-2004&ctx_enc=info%3Aofi%2Fenc%3AUTF-8&rfr_id=info%3Asid%2Fsummon.serialssolutions.com&rft_val_fmt=info%3Aofi%2Ffmt%3Akev%3Amtx%3Ajournal&rft.genre=article&rft.atitle=Factors+influencing+ion+energy+distributions+in+pulsed+inductively+coupled+argon+plasmas&rft.jtitle=Journal+of+physics.+D%2C+Applied+physics&rft.au=Chen%2C+Zhiying&rft.au=Longo%2C+Roberto+C&rft.au=Hummel%2C+Michael&rft.au=Carruth%2C+Megan&rft.date=2020-08-12&rft.pub=IOP+Publishing&rft.issn=0022-3727&rft.eissn=1361-6463&rft.volume=53&rft.issue=33&rft_id=info:doi/10.1088%2F1361-6463%2Fab8b08&rft.externalDocID=dab8b08
thumbnail_l http://covers-cdn.summon.serialssolutions.com/index.aspx?isbn=/lc.gif&issn=0022-3727&client=summon
thumbnail_m http://covers-cdn.summon.serialssolutions.com/index.aspx?isbn=/mc.gif&issn=0022-3727&client=summon
thumbnail_s http://covers-cdn.summon.serialssolutions.com/index.aspx?isbn=/sc.gif&issn=0022-3727&client=summon