High precision optical characterization of semiconductor saturable absorber mirrors
Semiconductor saturable absorber mirrors (SESAMs) have become a key element of many ultrafast laser sources, enabling passively modelocked lasers with >100 GHz repetition rate or with >10 microJ pulse energy. Precise knowledge of the nonlinear optical reflectivity is required to optimize the S...
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| Vydané v: | Optics express Ročník 16; číslo 10; s. 7571 |
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| Hlavní autori: | , , , , , , |
| Médium: | Journal Article |
| Jazyk: | English |
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United States
12.05.2008
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| ISSN: | 1094-4087, 1094-4087 |
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| Abstract | Semiconductor saturable absorber mirrors (SESAMs) have become a key element of many ultrafast laser sources, enabling passively modelocked lasers with >100 GHz repetition rate or with >10 microJ pulse energy. Precise knowledge of the nonlinear optical reflectivity is required to optimize the SESAMs for self-starting passive modelocking at record high repetition rates or pulse energies. In this article, we discuss a new method for wide dynamic range nonlinear reflectivity measurements. We achieve a higher accuracy (<0.05%) with a simpler and more cost-efficient measurement scheme compared with previous measurement systems. The method can easily be implemented for arbitrary wavelength regions and fluence ranges. |
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| AbstractList | Semiconductor saturable absorber mirrors (SESAMs) have become a key element of many ultrafast laser sources, enabling passively modelocked lasers with >100 GHz repetition rate or with >10 microJ pulse energy. Precise knowledge of the nonlinear optical reflectivity is required to optimize the SESAMs for self-starting passive modelocking at record high repetition rates or pulse energies. In this article, we discuss a new method for wide dynamic range nonlinear reflectivity measurements. We achieve a higher accuracy (<0.05%) with a simpler and more cost-efficient measurement scheme compared with previous measurement systems. The method can easily be implemented for arbitrary wavelength regions and fluence ranges.Semiconductor saturable absorber mirrors (SESAMs) have become a key element of many ultrafast laser sources, enabling passively modelocked lasers with >100 GHz repetition rate or with >10 microJ pulse energy. Precise knowledge of the nonlinear optical reflectivity is required to optimize the SESAMs for self-starting passive modelocking at record high repetition rates or pulse energies. In this article, we discuss a new method for wide dynamic range nonlinear reflectivity measurements. We achieve a higher accuracy (<0.05%) with a simpler and more cost-efficient measurement scheme compared with previous measurement systems. The method can easily be implemented for arbitrary wavelength regions and fluence ranges. Semiconductor saturable absorber mirrors (SESAMs) have become a key element of many ultrafast laser sources, enabling passively modelocked lasers with >100 GHz repetition rate or with >10 microJ pulse energy. Precise knowledge of the nonlinear optical reflectivity is required to optimize the SESAMs for self-starting passive modelocking at record high repetition rates or pulse energies. In this article, we discuss a new method for wide dynamic range nonlinear reflectivity measurements. We achieve a higher accuracy (<0.05%) with a simpler and more cost-efficient measurement scheme compared with previous measurement systems. The method can easily be implemented for arbitrary wavelength regions and fluence ranges. |
| Author | Maas, D. J. Rudin, B. Iwaniuk, D. Südmeyer, T. Bellancourt, A.-R. Marchese, S. V. Keller, U. |
| Author_xml | – sequence: 1 givenname: D. J. surname: Maas fullname: Maas, D. J. – sequence: 2 givenname: B. surname: Rudin fullname: Rudin, B. – sequence: 3 givenname: A.-R. surname: Bellancourt fullname: Bellancourt, A.-R. – sequence: 4 givenname: D. surname: Iwaniuk fullname: Iwaniuk, D. – sequence: 5 givenname: S. V. surname: Marchese fullname: Marchese, S. V. – sequence: 6 givenname: T. surname: Südmeyer fullname: Südmeyer, T. – sequence: 7 givenname: U. surname: Keller fullname: Keller, U. |
| BackLink | https://www.ncbi.nlm.nih.gov/pubmed/18545462$$D View this record in MEDLINE/PubMed |
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| References | Maas (oe-16-10-7571-R13) 2007; 88 Krainer (oe-16-10-7571-R3) 2002; 38 Marchese (oe-16-10-7571-R4) 2008; 16 Keller (oe-16-10-7571-R12) 2006; 429 Haiml (oe-16-10-7571-R14) 2004; 79 Grange (oe-16-10-7571-R8) 2005; 80 Zeller (oe-16-10-7571-R9) 2007; 43 Spence (oe-16-10-7571-R6) 1991; 16 Keller (oe-16-10-7571-R1) 1996; 2 Schibli (oe-16-10-7571-R7) 2000; 70 Marchese (oe-16-10-7571-R11) 2007; 15 Keller (oe-16-10-7571-R2) 2003; 424 Hönninger (oe-16-10-7571-R5) 1999; 16 Spühler (oe-16-10-7571-R10) 2005; 81 |
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