Enhanced photoelectrochemical properties of WO3 thin films fabricated by reactive magnetron sputtering
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| Vydáno v: | International journal of hydrogen energy Ročník 36; číslo 8; s. 4724 - 4731 |
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| Hlavní autoři: | , , , , , , , |
| Médium: | Journal Article |
| Jazyk: | angličtina |
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Kidlington
Elsevier
01.04.2011
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| ISSN: | 0360-3199 |
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| Author | Hofmann, Martin Vidyarthi, Vinay Shankar Ludwig, Alfred Savan, Alan König, Dennis Beranek, Radim Schuhmann, Wolfgang Sliozberg, Kirill |
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| Author_xml | – sequence: 1 givenname: Vinay Shankar surname: Vidyarthi fullname: Vidyarthi, Vinay Shankar – sequence: 2 givenname: Martin surname: Hofmann fullname: Hofmann, Martin – sequence: 3 givenname: Alan surname: Savan fullname: Savan, Alan – sequence: 4 givenname: Kirill surname: Sliozberg fullname: Sliozberg, Kirill – sequence: 5 givenname: Dennis surname: König fullname: König, Dennis – sequence: 6 givenname: Radim surname: Beranek fullname: Beranek, Radim – sequence: 7 givenname: Wolfgang surname: Schuhmann fullname: Schuhmann, Wolfgang – sequence: 8 givenname: Alfred surname: Ludwig fullname: Ludwig, Alfred |
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| Issue | 8 |
| Keywords | High-throughput Magnetron Hydrogen Reactive magnetron sputtering Gas pressure Steady state Thin film Tungsten oxide Photocurrent Tungsten Solar water splitting Thickness-gradient Chemical decomposition Microstructure Charge transfer Photooxidation |
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