Vidyarthi, V. S., Hofmann, M., Savan, A., Sliozberg, K., König, D., Beranek, R., . . . Ludwig, A. (2011). Enhanced photoelectrochemical properties of WO3 thin films fabricated by reactive magnetron sputtering. International journal of hydrogen energy, 36(8), 4724-4731. https://doi.org/10.1016/j.ijhydene.2011.01.087
Citace podle Chicago (17th ed.)Vidyarthi, Vinay Shankar, Martin Hofmann, Alan Savan, Kirill Sliozberg, Dennis König, Radim Beranek, Wolfgang Schuhmann, a Alfred Ludwig. "Enhanced Photoelectrochemical Properties of WO3 Thin Films Fabricated by Reactive Magnetron Sputtering." International Journal of Hydrogen Energy 36, no. 8 (2011): 4724-4731. https://doi.org/10.1016/j.ijhydene.2011.01.087.
Citace podle MLA (9th ed.)Vidyarthi, Vinay Shankar, et al. "Enhanced Photoelectrochemical Properties of WO3 Thin Films Fabricated by Reactive Magnetron Sputtering." International Journal of Hydrogen Energy, vol. 36, no. 8, 2011, pp. 4724-4731, https://doi.org/10.1016/j.ijhydene.2011.01.087.