APA (7th ed.) Citation

Vidyarthi, V. S., Hofmann, M., Savan, A., Sliozberg, K., König, D., Beranek, R., . . . Ludwig, A. (2011). Enhanced photoelectrochemical properties of WO3 thin films fabricated by reactive magnetron sputtering. International journal of hydrogen energy, 36(8), 4724-4731. https://doi.org/10.1016/j.ijhydene.2011.01.087

Chicago Style (17th ed.) Citation

Vidyarthi, Vinay Shankar, Martin Hofmann, Alan Savan, Kirill Sliozberg, Dennis König, Radim Beranek, Wolfgang Schuhmann, and Alfred Ludwig. "Enhanced Photoelectrochemical Properties of WO3 Thin Films Fabricated by Reactive Magnetron Sputtering." International Journal of Hydrogen Energy 36, no. 8 (2011): 4724-4731. https://doi.org/10.1016/j.ijhydene.2011.01.087.

MLA (9th ed.) Citation

Vidyarthi, Vinay Shankar, et al. "Enhanced Photoelectrochemical Properties of WO3 Thin Films Fabricated by Reactive Magnetron Sputtering." International Journal of Hydrogen Energy, vol. 36, no. 8, 2011, pp. 4724-4731, https://doi.org/10.1016/j.ijhydene.2011.01.087.