Electrical properties of strained off-stoichiometric Cu–Cr–O delafossite thin films

Off-stoichiometric Cu-Cr-O delafossite thin films with different thicknesses were grown by metal organic chemical vapor deposition on substrates with different coefficients of thermal expansion. Seebeck thermoelectric coefficient and resistivity measurements were performed on the range of 300-850 K....

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Vydané v:	Journal of physics. Condensed matter Ročník 36; číslo 21
Hlavní autori:	Moreira, Marco, Crêpellière, Jonathan, Polesel-Maris, Jérôme, Leturcq, Renaud, Guillot, Jérôme, Fleming, Yves, Lunca-Popa, Petru
Médium:	Journal Article
Jazyk:	English
Vydavateľské údaje:	England IOP Publishing 29.05.2024
Predmet:	copper chromium oxide delafossite electronic properties strain strain electronic properties off-stoichiometric copper chromium oxide
ISSN:	0953-8984, 1361-648X, 1361-648X
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