Milliwatt power UV-A LEDs developed by using n-AlGaN superlattice buffer layers grown on AlN templates
Ultraviolet (UV)-A light-emitting diode (LED) light sources are strongly demanded for both medical and photochemical applications. In our previous report, we investigated the conventional n-AlGaN buffer layer (BL)-based UV-A LED devices and a very low output power was achieved. In this work, we aim...
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| Vydáno v: | Journal of physics. D, Applied physics Ročník 52; číslo 11 |
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| Hlavní autoři: | , , , , , |
| Médium: | Journal Article |
| Jazyk: | angličtina |
| Vydáno: |
IOP Publishing
13.03.2019
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| Témata: | |
| ISSN: | 0022-3727, 1361-6463 |
| On-line přístup: | Získat plný text |
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| Shrnutí: | Ultraviolet (UV)-A light-emitting diode (LED) light sources are strongly demanded for both medical and photochemical applications. In our previous report, we investigated the conventional n-AlGaN buffer layer (BL)-based UV-A LED devices and a very low output power was achieved. In this work, we aim for the suppression of vertically propagating threading dislocation densities (TDDs) in the n-AlGaN BL including the current spreading layer (CSL) by introducing Si-doped n-Al0.37Ga0.63N/n-Al0.27Ga0.73N superlattices (SLs) between the AlN template and n-AlGaN BL for the demonstration of 341 nm UV-A LEDs. When the conventional n-AlGaN BLs were replaced with n-AlGaN SL-based BLs (with a suitable number of periods up to ~70) in the UV-A multi-quantum wells, then the full width at half maximum of the x-ray rocking curves in the n-AlGaN CSL for the (0 0 0 2) and (10-12) planes, respectively, were reduced to 346 and 431 arcsec and the total TDDs were suppressed to approximately ~1 × 109 cm−2. Finally, when the conventional Ni (20 nm)/Au (150 nm) p-electrodes were replaced with new Ni (1 nm)/Mg (200 nm) p-electrodes in the n-AlGaN SL-based UV-A LEDs, the maximum output power was improved from 2.1 to 2.5 mW. |
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| Bibliografie: | JPhysD-117335.R4 |
| ISSN: | 0022-3727 1361-6463 |
| DOI: | 10.1088/1361-6463/aaf60a |