Influence of chemisorption on the double hysteresis phenomenon during reactive sputtering

Process curves that are obtained during reactive magnetron sputtering can exhibit a double S-shape, also termed a double hysteresis. A previous study mainly focused on the relationship between the double shape behavior and the reaction kinetics of implanted reactive ions, although chemisorption also...

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Vydané v:	Applied surface science Ročník 613; s. 155901
Hlavní autori:	Van Bever, Josja, Strijckmans, Koen, Depla, Diederik
Médium:	Journal Article
Jazyk:	English
Vydavateľské údaje:	Elsevier B.V 15.03.2023
Predmet:	Modeling Reactive sputtering Target poisoning Target poisoning Modeling Reactive sputtering
ISSN:	0169-4332
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