Nitride formation during reactive sputter deposition of multi-principal element alloys in argon/nitrogen mixtures

•Reactive sputtering of nitrides based on multi-principal element alloys.•Film texture of low reactivity materials is defined by the sputtered nitrogen.•Correlation between target reactivity and average electronegativity. Nitrides based on multi-principal element alloys have been deposited by reacti...

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Vydáno v:	Thin solid films Ročník 732; s. 138721
Hlavní autoři:	Depla, Diederik, Dedoncker, Robin, Strijckmans, Koen
Médium:	Journal Article
Jazyk:	angličtina
Vydáno:	Elsevier B.V 31.08.2021
Témata:	Energy resolved mass spectrometry Magnetron Multi-principal element nitrides Reactive sputtering Reactive sputtering Magnetron Energy resolved mass spectrometry Multi-principal element nitrides
ISSN:	0040-6090, 1879-2731
On-line přístup:	Získat plný text
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