Nitride formation during reactive sputter deposition of multi-principal element alloys in argon/nitrogen mixtures

•Reactive sputtering of nitrides based on multi-principal element alloys.•Film texture of low reactivity materials is defined by the sputtered nitrogen.•Correlation between target reactivity and average electronegativity. Nitrides based on multi-principal element alloys have been deposited by reacti...

Ausführliche Beschreibung

Bibliographische Detailangaben

Veröffentlicht in:	Thin solid films Jg. 732; S. 138721
Hauptverfasser:	Depla, Diederik, Dedoncker, Robin, Strijckmans, Koen
Format:	Journal Article
Sprache:	Englisch
Veröffentlicht:	Elsevier B.V 31.08.2021
Schlagworte:	Energy resolved mass spectrometry Magnetron Multi-principal element nitrides Reactive sputtering Reactive sputtering Magnetron Energy resolved mass spectrometry Multi-principal element nitrides
ISSN:	0040-6090, 1879-2731
Online-Zugang:	Volltext
Tags:	Tag hinzufügen Keine Tags, Fügen Sie den ersten Tag hinzu!