Nitride formation during reactive sputter deposition of multi-principal element alloys in argon/nitrogen mixtures

•Reactive sputtering of nitrides based on multi-principal element alloys.•Film texture of low reactivity materials is defined by the sputtered nitrogen.•Correlation between target reactivity and average electronegativity. Nitrides based on multi-principal element alloys have been deposited by reacti...

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Bibliographic Details

Published in:	Thin solid films Vol. 732; p. 138721
Main Authors:	Depla, Diederik, Dedoncker, Robin, Strijckmans, Koen
Format:	Journal Article
Language:	English
Published:	Elsevier B.V 31.08.2021
Subjects:	Energy resolved mass spectrometry Magnetron Multi-principal element nitrides Reactive sputtering Reactive sputtering Magnetron Energy resolved mass spectrometry Multi-principal element nitrides
ISSN:	0040-6090, 1879-2731
Online Access:	Get full text
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