Energy dependence of morphologies on photoresist surfaces under Ar+ ion bombardment with normal incidence

[Display omitted] •Energy dependence of resist morphology under ion bombardment is demonstrated.•Light molecules in organic resist were enriched by ion bombardment.•Ion energy shows great potential for modulating chemistry and morphology.•Nanoholes were formed on organic resist in a wide ion energy...

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Vydané v:	Applied surface science Ročník 523; s. 146510
Hlavní autori:	Yang, Gaoyuan, Hirsch, Dietmar, Li, Jinyu, Liu, Ying, Frost, Frank, Hong, Yilin
Médium:	Journal Article
Jazyk:	English
Vydavateľské údaje:	Elsevier B.V 01.09.2020
Predmet:	Ion bombardment Ion energy Nanoholes Nanostructures Photoresist surface ToF-SIMS Nanostructures ToF-SIMS Ion energy Photoresist surface Ion bombardment Nanoholes
ISSN:	0169-4332, 1873-5584
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