Ma, Z., Chen, Y., & Pan, T. (2025). An intelligent MIMO run-to-run controller for semiconductor manufacturing processes based on an enhanced twin-delayed deep deterministic policy gradient algorithm. Applied intelligence (Dordrecht, Netherlands), 55(10), 732. https://doi.org/10.1007/s10489-025-06615-x
Chicago Style (17th ed.) CitationMa, Zhu, Yonglin Chen, and Tianhong Pan. "An Intelligent MIMO Run-to-run Controller for Semiconductor Manufacturing Processes Based on an Enhanced Twin-delayed Deep Deterministic Policy Gradient Algorithm." Applied Intelligence (Dordrecht, Netherlands) 55, no. 10 (2025): 732. https://doi.org/10.1007/s10489-025-06615-x.
MLA (9th ed.) CitationMa, Zhu, et al. "An Intelligent MIMO Run-to-run Controller for Semiconductor Manufacturing Processes Based on an Enhanced Twin-delayed Deep Deterministic Policy Gradient Algorithm." Applied Intelligence (Dordrecht, Netherlands), vol. 55, no. 10, 2025, p. 732, https://doi.org/10.1007/s10489-025-06615-x.