Hybrid HIPIMS+MFMS power supply for dual magnetron sputtering systems

The paper presents a novel power supply device that provides a hybrid technique of dual magnetron sputtering. This power supply generates a sequence of bipolar pulses which provides both mid-frequency and high-power impulse magnetron sputtering. This allows using the advantages of both techniques, w...

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Bibliographic Details

Published in:	Vacuum Vol. 181; p. 109670
Main Authors:	Oskirko, V.O., Zakharov, A.N., Pavlov, A.P., Solovyev, А.А., Semenov, V.A., Rabotkin, S.V.
Format:	Journal Article
Language:	English
Published:	Elsevier Ltd 01.11.2020
Subjects:	Dual magnetron sputtering High-power impulse magnetron sputtering Mid-frequency magnetron sputtering Superimposed MF and HIPIMS High-power impulse magnetron sputtering Mid-frequency magnetron sputtering Dual magnetron sputtering Superimposed MF and HIPIMS
ISSN:	0042-207X, 1879-2715
Online Access:	Get full text
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