Metal-Catalyzed Electroless Etching of Silicon in Aerated HF/H2O Vapor for Facile Fabrication of Silicon Nanostructures
Inspired by metal corrosion in air, we demonstrate that metal-catalyzed electroless etching (MCEE) of silicon can be performed simply in aerated HF/H2O vapor for facile fabrication of three-dimensional silicon nanostructures such as silicon nanowires (SiNW) arrays. Compared to MCEE commonly performe...
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| Published in: | Nano letters Vol. 14; no. 8; pp. 4212 - 4219 |
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| Main Authors: | , , , , , , , |
| Format: | Journal Article |
| Language: | English |
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Washington, DC
American Chemical Society
13.08.2014
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| ISSN: | 1530-6984, 1530-6992, 1530-6992 |
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| Abstract | Inspired by metal corrosion in air, we demonstrate that metal-catalyzed electroless etching (MCEE) of silicon can be performed simply in aerated HF/H2O vapor for facile fabrication of three-dimensional silicon nanostructures such as silicon nanowires (SiNW) arrays. Compared to MCEE commonly performed in aqueous HF solution, the present pseudo gas phase etching offers exceptional simplicity, flexibility, environmental friendliness, and scalability for the fabrication of three-dimensional silicon nanostructures with considerable depths because of replacement of harsh oxidants such as H2O2 and AgNO3 by environmental-green and ubiquitous oxygen in air, minimum water consumption, and full utilization of HF. |
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| AbstractList | Inspired by metal corrosion in air, we demonstrate that metal-catalyzed electroless etching (MCEE) of silicon can be performed simply in aerated HF/H2O vapor for facile fabrication of three-dimensional silicon nanostructures such as silicon nanowires (SiNW) arrays. Compared to MCEE commonly performed in aqueous HF solution, the present pseudo gas phase etching offers exceptional simplicity, flexibility, environmental friendliness, and scalability for the fabrication of three-dimensional silicon nanostructures with considerable depths because of replacement of harsh oxidants such as H2O2 and AgNO3 by environmental-green and ubiquitous oxygen in air, minimum water consumption, and full utilization of HF. Inspired by metal corrosion in air, we demonstrate that metal-catalyzed electroless etching (MCEE) of silicon can be performed simply in aerated HF/H2O vapor for facile fabrication of three-dimensional silicon nanostructures such as silicon nanowires (SiNW) arrays. Compared to MCEE commonly performed in aqueous HF solution, the present pseudo gas phase etching offers exceptional simplicity, flexibility, environmental friendliness, and scalability for the fabrication of three-dimensional silicon nanostructures with considerable depths because of replacement of harsh oxidants such as H2O2 and AgNO3 by environmental-green and ubiquitous oxygen in air, minimum water consumption, and full utilization of HF.Inspired by metal corrosion in air, we demonstrate that metal-catalyzed electroless etching (MCEE) of silicon can be performed simply in aerated HF/H2O vapor for facile fabrication of three-dimensional silicon nanostructures such as silicon nanowires (SiNW) arrays. Compared to MCEE commonly performed in aqueous HF solution, the present pseudo gas phase etching offers exceptional simplicity, flexibility, environmental friendliness, and scalability for the fabrication of three-dimensional silicon nanostructures with considerable depths because of replacement of harsh oxidants such as H2O2 and AgNO3 by environmental-green and ubiquitous oxygen in air, minimum water consumption, and full utilization of HF. |
| Author | Zhang, Fu-Qiang Peng, Kui-Qing Qiao, Zhen Hu, Ya Lee, Shuit-Tong Sun, Rui-Nan Huang, Xing Meng, Xiang-Min |
| AuthorAffiliation | Department of Physics and Beijing Key Laboratory of Energy Conversion and Storage Materials Chinese Academy of Sciences Beijing Normal University Technical Institute of Physics and Chemistry and Key Laboratory of Photochemical Conversion and Optoelectronic Materials Soochow University Institute of Functional Nano and Soft Materials (FUNSOM) and Collaborative Innovation Center of Suzhou Nano Science and Technology |
| AuthorAffiliation_xml | – name: Department of Physics and Beijing Key Laboratory of Energy Conversion and Storage Materials – name: Technical Institute of Physics and Chemistry and Key Laboratory of Photochemical Conversion and Optoelectronic Materials – name: Soochow University – name: Beijing Normal University – name: Institute of Functional Nano and Soft Materials (FUNSOM) and Collaborative Innovation Center of Suzhou Nano Science and Technology – name: Chinese Academy of Sciences |
| Author_xml | – sequence: 1 givenname: Ya surname: Hu fullname: Hu, Ya – sequence: 2 givenname: Kui-Qing surname: Peng fullname: Peng, Kui-Qing email: kq_peng@bnu.edu.cn – sequence: 3 givenname: Zhen surname: Qiao fullname: Qiao, Zhen – sequence: 4 givenname: Xing surname: Huang fullname: Huang, Xing – sequence: 5 givenname: Fu-Qiang surname: Zhang fullname: Zhang, Fu-Qiang – sequence: 6 givenname: Rui-Nan surname: Sun fullname: Sun, Rui-Nan – sequence: 7 givenname: Xiang-Min surname: Meng fullname: Meng, Xiang-Min – sequence: 8 givenname: Shuit-Tong surname: Lee fullname: Lee, Shuit-Tong email: apannale@suda.edu.cn |
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| Keywords | gas phase etching electrochemistry galvanic etching Silicon nanowire Catalysts Corrosion Aqueous solutions Hafnium Etching Silicon Nanowires Nanostructures Arrays Flexibility Nanostructured materials |
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| Snippet | Inspired by metal corrosion in air, we demonstrate that metal-catalyzed electroless etching (MCEE) of silicon can be performed simply in aerated HF/H2O vapor... |
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| SubjectTerms | Catalytic methods Condensed matter: structure, mechanical and thermal properties Cross-disciplinary physics: materials science; rheology Exact sciences and technology Low-dimensional structures (superlattices, quantum well structures, multilayers): structure, and nonelectronic properties Materials science Methods of nanofabrication Nanocrystalline materials Nanoscale materials and structures: fabrication and characterization Physics Quantum wires Surfaces and interfaces; thin films and whiskers (structure and nonelectronic properties) |
| Title | Metal-Catalyzed Electroless Etching of Silicon in Aerated HF/H2O Vapor for Facile Fabrication of Silicon Nanostructures |
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