AdaOPC: A Self-Adaptive Mask Optimization Framework For Real Design Patterns

Optical proximity correction (OPC) is a widely-used resolution enhancement technique (RET) for printability optimization. Recently, rigorous numerical optimization and fast machine learning are the research focus of OPC in both academia and industry, each of which complements the other in terms of r...

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Bibliographic Details

Published in:	2022 IEEE/ACM International Conference On Computer Aided Design (ICCAD) pp. 1 - 9
Main Authors:	Zhao, Wenqian, Yao, Xufeng, Yu, Ziyang, Chen, Guojin, Ma, Yuzhe, Yu, Bei, Wong, Martin D.F.
Format:	Conference Proceeding
Language:	English
Published:	ACM 29.10.2022
Subjects:	Industries Layout Libraries Machine learning Robustness Search problems Shape
ISSN:	1558-2434
Online Access:	Get full text
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