Impact of nanomanufacturing flow on systematic yield losses in nanoscale fabrics

Reliable and scalable manufacturing of nanofabrics entails significant challenges. Scalable nanomanufacturing approaches that employ the use of lithographic masks in conjunction with nanofabrication based on self-assembly have been proposed. A bottom-up fabrication of nanoelectronic circuits is expe...

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Bibliographic Details
Published in:	2011 IEEE/ACM International Symposium on Nanoscale Architectures pp. 181 - 188
Main Authors:	Vijayakumar, Priyamvada, Narayanan, Pritish, Koren, Israel, Mani Krishna, C., Moritz, Csaba Andras
Format:	Conference Proceeding
Language:	English
Published:	Washington, DC, USA IEEE Computer Society 08.06.2011 IEEE
Series:	ACM Conferences
Subjects:	Applied computing > Enterprise computing Applied computing > Operations research > Industry and manufacturing Applied computing > Physical sciences and engineering > Electronics CMOS integrated circuits Fabrics Manufacturing mask alignment mask offset Metals Nanoscale devices Nanowires overlay Systematics yield
ISBN:	1457709937, 9781457709937
ISSN:	2327-8218
Online Access:	Get full text
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