Curvilinear Optical Proximity Correction via Cardinal Spline

This paper presents a novel curvilinear optical proximity correction (OPC) framework. The proposed approach involves representing mask patterns with control points, which are interconnected through cardinal splines. Mask optimization is achieved by iteratively adjusting these control points, guided...

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Bibliographic Details

Published in:	2025 62nd ACM/IEEE Design Automation Conference (DAC) pp. 1 - 7
Main Authors:	Zheng, Su, Liang, Xiaoxiao, Yu, Ziyang, Ma, Yuzhe, Yu, Bei, Wong, Martin
Format:	Conference Proceeding
Language:	English
Published:	IEEE 22.06.2025
Subjects:	Adaptive optics Design automation Fitting Layout Lithography Optical interconnections Optimization Scalability Splines (mathematics) Testing
Online Access:	Get full text
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