Curvilinear Optical Proximity Correction via Cardinal Spline

This paper presents a novel curvilinear optical proximity correction (OPC) framework. The proposed approach involves representing mask patterns with control points, which are interconnected through cardinal splines. Mask optimization is achieved by iteratively adjusting these control points, guided...

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Vydané v:	2025 62nd ACM/IEEE Design Automation Conference (DAC) s. 1 - 7
Hlavní autori:	Zheng, Su, Liang, Xiaoxiao, Yu, Ziyang, Ma, Yuzhe, Yu, Bei, Wong, Martin
Médium:	Konferenčný príspevok..
Jazyk:	English
Vydavateľské údaje:	IEEE 22.06.2025
Predmet:	Adaptive optics Design automation Fitting Layout Lithography Optical interconnections Optimization Scalability Splines (mathematics) Testing
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