X-ray diffraction at elevated temperatures. A method for in situ process analysis /
Saved in:
| Main Author: | |
|---|---|
| Format: | Book |
| Language: | English |
| Published: |
New York :
VCH Publishers,
1993
|
| Edition: | [1st ed.] |
| Subjects: | |
| ISBN: | 0895737450 |
| Online Access: |
|
| Tags: |
Add Tag
No Tags, Be the first to tag this record!
|
MARC
| LEADER | 00000nam a2200000 4500 | ||
|---|---|---|---|
| 003 | SK-BrCVT | ||
| 005 | 20220617191826.0 | ||
| 008 | 950602s1993 xxu e ||||||eng d | ||
| 020 | |a 0895737450 | ||
| 035 | |a CVTIDW0932318 | ||
| 040 | |b slo |a CVTI SR | ||
| 041 | 0 | |a eng | |
| 044 | |a xxu | ||
| 080 | |a 535.4-34 |2 UDC-MRF | ||
| 100 | 1 | |a Chung, Deborah D. L. | |
| 242 | 1 | 0 | |a Ohyb röntgenových lúčov pri zvýšených teplotách. Metóda in situ analýzy procesov |
| 245 | 1 | 0 | |a X-ray diffraction at elevated temperatures. A method for in situ process analysis / |c Authors: Deborah D. L. Chung and Co. |
| 250 | |a [1st ed.] | ||
| 260 | |a New York : |b VCH Publishers, |c 1993 | ||
| 300 | |a VIII, 268 s. : |b grafy, lit., obr., tab. ; | ||
| 653 | 1 | |a zdroj röntgenových lúčov |a prístrojové vybavenie |a kinetické skúmanie | |
| 655 | 7 | |a odborné publikácie |2 SNKPH | |
| 692 | |a GM VD PR JM MM | ||
| 910 | |b A547511 | ||
| 919 | |a 0-89573-745-0 | ||
| 974 | |f Knihy | ||
| 992 | |a AMG | ||
| 999 | |c 93480 |d 93480 | ||