Lateral scanning method and apparatus for generating uniform large area optical interference patterns
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| Název: | Lateral scanning method and apparatus for generating uniform large area optical interference patterns |
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| Patent Number: | 11644,665 |
| Datum vydání: | May 09, 2023 |
| Appl. No: | 17/034956 |
| Application Filed: | September 28, 2020 |
| Abstrakt: | This disclosure of a scanner and method is a new way of removing non-uniformities from optical interference patterns. |
| Inventors: | Frauenglass, Andrew (Albuquerque, NM, US) |
| Claim: | 1. A lateral scanner comprising: a vertical refraction block with parallel planar surfaces attached to a vertical galvanometer, a horizontal refraction block with parallel planar surfaces attached to a horizontal galvanometer, a galvanometer controller, a means where a light beam of an optical interference pattern generation system is scanned laterally before the light beam is split into two beams. |
| Claim: | 2. A method where a light beam is translated laterally from a first beam path to a second beam path comprising: providing a vertical refraction block with parallel planar surfaces attached to a vertical galvanometer; providing a horizontal refraction block with parallel planar surfaces attached to a horizontal galvanometer; translating a light beam laterally from the first beam path to the second beam path by rotating the vertical refraction block from a first position to a second position, wherein the second position creates a non-orthogonal surface with respect to the light beam thereby refracting the light beam and changing its optical path; wherein only after exiting the vertical refraction block is the light beam split into two beams. |
| Patent References Cited: | 5153773 October 1992 Muraki 11460685 October 2022 Hillman 20090021801 January 2009 Ishihara |
| Primary Examiner: | Sufleta, II, Gerald J |
| Přístupové číslo: | edspgr.11644665 |
| Databáze: | USPTO Patent Grants |
| Abstrakt: | This disclosure of a scanner and method is a new way of removing non-uniformities from optical interference patterns. |
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