Podrobná bibliografie
| Název: |
DIFFRACTION GRATING STRUCTURE COMPRISING SEVERAL GRATING LINES |
| Document Number: |
20240103208 |
| Datum vydání: |
March 28, 2024 |
| Appl. No: |
18/525016 |
| Application Filed: |
November 30, 2023 |
| Abstrakt: |
In one embodiment of the disclosure, a diffraction grating structure is proposed comprising several grating lines. The diffraction grating structure is associated with a propagation layer, and the diffraction grating structure is made of a material that has a refractive index being equal to n2(λ). The diffraction grating structure is remarkable in that it comprises T grating lines per μm, with T=(n2(λ)+1)/2λ, where λ is a wavelength defined from an incident electromagnetic wave. |
| Claim: |
1. A diffraction grating structure comprising several grating lines, said diffraction grating structure being positioned on a propagation layer of refractive index n2(λ)≥3, said diffraction grating structure being made of a material that has a refractive index equal to n2(λ), wherein the diffraction grating structure comprises T grating lines per μm, with T=(n2(λ)+1)/2λ, where λ is a wavelength defined from an incident electromagnetic wave. |
| Claim: |
2. The diffraction grating structure according to claim 1, wherein said material is silicon, and wherein the propagation layer comprises a silicon layer not greater than about 10 μm in thickness. |
| Claim: |
3. The diffraction grating structure according to claim 1, wherein a wavelength of the incident electromagnetic wave is around 486 nm. |
| Claim: |
4. The diffraction grating structure according to claim 1, wherein a wavelength of the incident electromagnetic wave is around 588 nm. |
| Claim: |
5. The diffraction grating structure according to claim 1, wherein a wavelength of the incident electromagnetic wave is around 656 nm. |
| Claim: |
6. An optical device comprising a light emitting source configured to emit electromagnetic waves having a wavelength λ that corresponds to at least one of three primary colors among red, blue and green colors, and a diffraction grating structure according to claim 1 configured to receive the electromagnetic waves emitted by the light emitting source. |
| Claim: |
7. The optical device according to claim 6, wherein it further comprises at least another diffraction grating structure comprising several grating lines, said at least another diffraction grating structure being positioned on said diffraction grating structure, said at least another diffraction grating structure being made of a material having a refractive index being equal to n3(λ), said at least another diffraction grating structure having a number of grating lines per μm substantially equal to (n3(λ)+1)/2λ. |
| Claim: |
8. The optical device according to claim 6, wherein each incident electromagnetic wave is normal compared to diffraction grating structures comprised in said optical device. |
| Claim: |
9. The optical device according to claim 6, wherein the grating lines of said diffraction grating structure define a rectangle with a length of 1 to 10 mm, and a width of 1 to 10 mm. |
| Claim: |
10. An OLED cell, comprising an anode positioned on a glass substrate, a cathode, and between the anode and the cathode respectively an electron transport layer, a light emitting material, and a hole transport layer, the light emitting material being associated with a light color, wherein said OLED cell comprises a diffraction grating structure positioned on said glass substrate according to claim 1, wherein the wavelength of the incident electromagnetic wave corresponds to the one associated with said light color. |
| Claim: |
11. The OLED cell according to claim 10, wherein the grating lines of said diffraction grating structure define a surface that covers 50% of said glass substrate of said OLED cell. |
| Claim: |
12. A solar cell comprising a diffraction grating structure according to claim 1, wherein λ is chosen as being substantially equal to 588 nm. |
| Claim: |
13. A method comprising: directing an electromagnetic wave with a wavelength λ onto a diffraction grating structure comprising several grating lines, said diffraction grating structure being positioned on a propagation layer of refractive index n2(λ)≥3, said diffraction grating structure being made of a material that has a refractive index being equal to n2(λ), wherein the diffraction grating structure comprises T grating lines per μm, with T=(n2(λ)+1)/2λ. |
| Claim: |
14. The method of claim 13, wherein the wavelength λ is in a range of 400 nm-800 nm. |
| Claim: |
15. The method of claim 13, wherein said material is silicon, and wherein the propagation layer comprises a silicon layer not greater than about 10 μm in thickness. |
| Current International Class: |
02; 21; 01; 10 |
| Přístupové číslo: |
edspap.20240103208 |
| Databáze: |
USPTO Patent Applications |