Bibliographic Details
| Title: |
SYSTEM AND METHODS RELATED TO GENERATING ELECTROMEGNETIC RADIATION INTERFERENCE PATTERNS |
| Document Number: |
20120099090 |
| Publication Date: |
April 26, 2012 |
| Appl. No: |
12/959128 |
| Application Filed: |
December 02, 2010 |
| Abstract: |
Systems and methods related to the generation of interference patterns using electromagnetic radiation are generally described. Some embodiments are directed to the use of such systems and methods to perform interference lithography. |
| Inventors: |
Berggren, Karl K. (Arlington, MA, US); Korre, Hasan (Cambridge, MA, US); Fucetola, Corey P. (Fort Collins, CO, US) |
| Assignees: |
Massachusetts Institute of Technology (Cambridge, MA, US) |
| Claim: |
1. A system for generating an interference pattern of electromagnetic radiation, comprising: a source of electromagnetic radiation comprising a laser and a diffraction grating constructed and arranged to provide optical feedback to the laser; and a spatial filter constructed and arranged to receive at least a portion of the electromagnetic radiation from the source, to transmit at least a first portion of the received electromagnetic radiation to a reflective surface, and to transmit a second portion of the received electromagnetic radiation to a pattern substrate. |
| Claim: |
2. A system for generating an interference pattern of electromagnetic radiation, comprising: a source of electromagnetic radiation; and a spatial filter comprising a focusing element and a transmission element, wherein: the focusing element and the transmission element are not substantially spatially adjustable relative to each other along a focal axis of the focusing element; and the spatial filter is constructed and arranged to receive at least a portion of the electromagnetic radiation from the source, to transmit at least a first portion of the received electromagnetic radiation to a reflective surface, and to transmit a second portion of the received electromagnetic radiation to a pattern substrate. |
| Claim: |
3. A system for generating an interference pattern of electromagnetic radiation, comprising: a source of electromagnetic radiation; a spatial filter; a reflective surface; and a pattern substrate; wherein: the spatial filter is constructed and arranged to receive at least a portion of the electromagnetic radiation from the source, to transmit at least a first portion of the received electromagnetic radiation to the reflective surface, and to transmit a second portion of the received electromagnetic radiation to the pattern substrate, and the reflective surface and the pattern substrate are not substantially spatially adjustable relative to each other. |
| Claim: |
4. A system for generating an interference pattern of electromagnetic radiation, comprising: a source of electromagnetic radiation, comprising a housing, a laser diode fixedly secured to the housing, and a diffraction grating fixedly secured to the housing and constructed and arranged to provide optical feedback to the laser diode; a spatial filter comprising a focusing element and a transmission element; a reflective surface; and a pattern substrate; wherein: the focusing element and the transmission element are constructed and arranged such that they are not substantially spatially adjustable relative to each other along a focal axis of the focusing element, and the spatial filter is constructed and arranged to receive at least a portion of the electromagnetic radiation from the source, transmit at least a first portion of the received electromagnetic radiation to the reflective surface, and transmit a second portion of the received electromagnetic radiation to the pattern substrate. |
| Claim: |
5. A system as in claim 2, wherein the source of electromagnetic radiation comprises a laser. |
| Claim: |
6. A system as in claim 1, wherein the laser comprises a laser diode. |
| Claim: |
7. A system as in claim 2, wherein the source of electromagnetic radiation comprises a diffraction grating constructed and arranged to provide optical feedback to the laser. |
| Claim: |
8. A system as in claim 1, wherein the laser and the diffraction grating are not substantially spatially adjustable relative to each other. |
| Claim: |
9. A system as in claim 1, wherein the spatial filter comprises a focusing element. |
| Claim: |
10. A system as in claim 9, wherein the focusing element comprises a lens. |
| Claim: |
11. A system as in claim 1, wherein the spatial filter comprises a transmission element. |
| Claim: |
12. A system as in claim 11, wherein the transmission element comprises an aperture formed in a material that reflects and/or absorbs at least one wavelength of the electromagnetic radiation from the source |
| Claim: |
13. A system as in claim 2, wherein the focusing element and the transmission element are not substantially spatially adjustable relative to each other along a focal axis of the focusing element. |
| Claim: |
14. A system as in claim 1, wherein the reflective surface and the pattern substrate are not substantially spatially adjustable relative to each other. |
| Claim: |
15. A system as in claim 1, wherein the reflective surface comprises a mirror. |
| Claim: |
16. A system as in claim 1, wherein the reflective surface and the pattern substrate are substantially fixed to a rotatably moveable mount. |
| Claim: |
17. A system as in claim 16, wherein the rotatably moveable mount is constructed and arranged such that, upon rotation, the angle of incidence of the electromagnetic radiation from the spatial filter upon the reflective surface and/or pattern substrate is altered. |
| Claim: |
18. A system as in claim 1, wherein the system is constructed and arranged for interference lithography. |
| Claim: |
19. A system as in claim 1, wherein the pattern substrate comprises photoresist. |
| Claim: |
20. A system as in claim 1, wherein the system is capable of producing a regular pattern that defines an area of at least about 0.1 mm2. |
| Claim: |
21. A system as in claim 1, wherein the system has a footprint of less than about 1 m2. |
| Claim: |
22. A kit for generating an interference pattern of electromagnetic radiation, the kit comprising a system as in claim 1. |
| Current U.S. Class: |
355/53 |
| Current International Class: |
03; 02; 02 |
| Accession Number: |
edspap.20120099090 |
| Database: |
USPTO Patent Applications |