Reduction of absorption of Ta2O5 monolayers through the suppression of structural defects by employing an appropriate ionic oxygen concentration
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| Název: | Reduction of absorption of Ta2O5 monolayers through the suppression of structural defects by employing an appropriate ionic oxygen concentration |
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| Autoři: | Lin Wang, Weili Zhang, Ruijin Hong, Kun Wang, Menglei Wang, Qinmin Wang, Kui Yi, Jianda Shao |
| Zdroj: | Scientific Reports, Vol 15, Iss 1, Pp 1-13 (2025) |
| Informace o vydavateli: | Nature Portfolio, 2025. |
| Rok vydání: | 2025 |
| Sbírka: | LCC:Medicine LCC:Science |
| Témata: | Ion-assisted deposition (IAD), Ta2O5 films, Absorption loss, Ionic oxygen concentration, Medicine, Science |
| Popis: | Abstract Ultralow-absorption laser films have critical applications in high-power continuous-laser and gravitational-wave-detection systems. During film deposition, the ionic oxygen concentration significantly affects the absorption loss of the film. In this study, Ta2O5 monolayers were deposited using an ion-assisted electron beam evaporation technique, and the weak absorption at 1064 nm, temperature rise, optical band gap, element content, and binding energy were tested and analyzed. The band structure and microdefects of the Ta2O5 films were characterized, and their correlation with the absorption properties was established. The analyses revealed that the primary mechanism responsible for reducing the absorption loss in Ta2O5 films was an appropriate ionic oxygen concentration, which improved the optical band gap and stoichiometric ratio and reduced oxygen vacancy defects. For Ta2O5 monolayers deposited with the optimal ionic oxygen concentration, the weak absorption was approximately 7.2 ppm and the temperature rise was approximately 0.6 °C, 1/4 and 1/3 of the values of those deposited with an excessive concentration, respectively—an important finding in the preparation of ultralow-absorption laser films. |
| Druh dokumentu: | article |
| Popis souboru: | electronic resource |
| Jazyk: | English |
| ISSN: | 2045-2322 |
| Relation: | https://doaj.org/toc/2045-2322 |
| DOI: | 10.1038/s41598-025-86151-3 |
| Přístupová URL adresa: | https://doaj.org/article/5ee5a8d1e86e41c6bec3cc93502e6f7d |
| Přístupové číslo: | edsdoj.5ee5a8d1e86e41c6bec3cc93502e6f7d |
| Databáze: | Directory of Open Access Journals |
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Nájsť tento článok vo Web of Science | Abstrakt: | Abstract Ultralow-absorption laser films have critical applications in high-power continuous-laser and gravitational-wave-detection systems. During film deposition, the ionic oxygen concentration significantly affects the absorption loss of the film. In this study, Ta2O5 monolayers were deposited using an ion-assisted electron beam evaporation technique, and the weak absorption at 1064 nm, temperature rise, optical band gap, element content, and binding energy were tested and analyzed. The band structure and microdefects of the Ta2O5 films were characterized, and their correlation with the absorption properties was established. The analyses revealed that the primary mechanism responsible for reducing the absorption loss in Ta2O5 films was an appropriate ionic oxygen concentration, which improved the optical band gap and stoichiometric ratio and reduced oxygen vacancy defects. For Ta2O5 monolayers deposited with the optimal ionic oxygen concentration, the weak absorption was approximately 7.2 ppm and the temperature rise was approximately 0.6 °C, 1/4 and 1/3 of the values of those deposited with an excessive concentration, respectively—an important finding in the preparation of ultralow-absorption laser films. |
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| ISSN: | 20452322 |
| DOI: | 10.1038/s41598-025-86151-3 |