Selective gas phase pulsed etching of oxides with NbCl5
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| Název: | Selective gas phase pulsed etching of oxides with NbCl5 |
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| Autoři: | Juha Ojala, Marko Vehkamäki, Mykhailo Chundak, Anton Vihervaara, Kenichiro Mizohata, Mikko Ritala |
| Přispěvatelé: | Department of Chemistry, Doctoral Programme in Materials Research and Nanosciences, HelsinkiALD, Department of Physics, Mikko Ritala / Principal Investigator |
| Zdroj: | Journal of Materials Chemistry C. 13:2347-2355 |
| Informace o vydavateli: | Royal Society of Chemistry (RSC), 2025. |
| Rok vydání: | 2025 |
| Témata: | Etching, Chemical sciences, Gas phase etching, Al3O2, 0103 physical sciences, Mechanisms, Ta2o5, ZrO2, isotropic etching, 02 engineering and technology, 0210 nano-technology, 01 natural sciences, Films |
| Popis: | NbCl5 was found to be a highly selective vapor phase etchant for Ta2O5, TiO2 and ZrO2. The mechanism of Ta2O5 etching was proven with thermodynamic and QMS studies, and selectivity was demonstrated on a patterned Al2O3/Ta2O5 double layer. |
| Druh dokumentu: | Article |
| Popis souboru: | application/pdf |
| Jazyk: | English |
| ISSN: | 2050-7534 2050-7526 |
| DOI: | 10.1039/d4tc03488k |
| Přístupová URL adresa: | http://hdl.handle.net/10138/589493 |
| Rights: | CC BY |
| Přístupové číslo: | edsair.doi.dedup.....c6c2ec5ad028458c1053a91fdb34654e |
| Databáze: | OpenAIRE |
Nájsť tento článok vo Web of Science | Abstrakt: | NbCl5 was found to be a highly selective vapor phase etchant for Ta2O5, TiO2 and ZrO2. The mechanism of Ta2O5 etching was proven with thermodynamic and QMS studies, and selectivity was demonstrated on a patterned Al2O3/Ta2O5 double layer. |
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| ISSN: | 20507534 20507526 |
| DOI: | 10.1039/d4tc03488k |