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Author response for 'Design optimization of mutual dissolution layer and diffusion interface layer in planar heterojunction near-infrared organic phototransistors for ultrahigh photosensitivity'

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Názov:	Author response for 'Design optimization of mutual dissolution layer and diffusion interface layer in planar heterojunction near-infrared organic phototransistors for ultrahigh photosensitivity'
Autori:	null Tao Han, null Yimin Zhang, null Tianxia Li, null Rui Jia, null Qingpeng Lai, null Bin Li, null Suolin Wu, null Xianhao Qian, null Shufang Ding, null Yaqi Chen, null Chunzhi Jiang
Informácie o vydavateľovi:	Royal Society of Chemistry (RSC), 2025.
Rok vydania:	2025
Druh dokumentu:	Review
DOI:	10.1039/d5ra05574a/v2/response1
Prístupové číslo:	edsair.doi...........046e19c9af16f0f8cc0d7a518cb9e3cd
Databáza:	OpenAIRE

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DOI:	10.1039/d5ra05574a/v2/response1