Lactic Acid Chemical Peeling in Skin Disorders.

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Názov: Lactic Acid Chemical Peeling in Skin Disorders.
Autori: Feng, Xiaoyue, Shang, Jianli, Gu, Zhengping, Luo, Xingyi, Chen, Yong, Liu, Youting
Zdroj: Clinical, Cosmetic & Investigational Dermatology; Apr2024, Vol. 17, p901-909, 9p
Predmety: CHEMICAL peel, LACTIC acid, COSMETIC dermatology, ORGANIC acids, WOUND healing
Abstrakt: Lactic acid is the most widely occurring natural organic acid in nature. It not only exhibits mild and safe properties but also possesses multiple physiological activities, such as antibacterial effects, immune regulation, and promotion of wound healing, making it one of the most popular chemical peeling agents. Chemical peels are commonly used in the field of aesthetic dermatology as a non-invasive therapeutic approach. This research aims to provide valuable references for clinical dermatologists by summarizing the characteristics of lactic acid, elucidating its mechanism of action in peeling, and investigating the clinical applications of this compound. Furthermore, it anticipates the potential for lactic acid to be the most suitable chemical peeling agent for Chinese skin. [ABSTRACT FROM AUTHOR]
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Databáza: Biomedical Index
Popis
Abstrakt:Lactic acid is the most widely occurring natural organic acid in nature. It not only exhibits mild and safe properties but also possesses multiple physiological activities, such as antibacterial effects, immune regulation, and promotion of wound healing, making it one of the most popular chemical peeling agents. Chemical peels are commonly used in the field of aesthetic dermatology as a non-invasive therapeutic approach. This research aims to provide valuable references for clinical dermatologists by summarizing the characteristics of lactic acid, elucidating its mechanism of action in peeling, and investigating the clinical applications of this compound. Furthermore, it anticipates the potential for lactic acid to be the most suitable chemical peeling agent for Chinese skin. [ABSTRACT FROM AUTHOR]
ISSN:11787015
DOI:10.2147/CCID.S455700