Effect of bias voltage on the microstructure and hardness of Ti-Si-N films deposited by using high-power impulse magnetron sputtering.
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| Titel: | Effect of bias voltage on the microstructure and hardness of Ti-Si-N films deposited by using high-power impulse magnetron sputtering. |
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| Autoren: | Ding, JiCheng, Zou, ChangWei, Wang, QiMin, Zeng, Kun, Feng, SiCheng |
| Quelle: | Journal of the Korean Physical Society; Jan2016, Vol. 68 Issue 2, p351-356, 6p |
| Datenbank: | Complementary Index |
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Nájsť tento článok vo Web of Science | ISSN: | 03744884 |
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| DOI: | 10.3938/jkps.68.351 |