In EDS ansehen

Diffraction by gratings with random fill factor.

Gespeichert in:
Bibliographische Detailangaben
Titel: Diffraction by gratings with random fill factor.
Autoren: Torcal-Milla FJ, Sanchez-Brea LM
Quelle: Applied optics [Appl Opt] 2017 Jun 20; Vol. 56 (18), pp. 5253-5257.
Publikationsart: Journal Article
Sprache: English
Info zur Zeitschrift: Publisher: Optica Publishing Group Country of Publication: United States NLM ID: 0247660 Publication Model: Print Cited Medium: Internet ISSN: 1539-4522 (Electronic) Linking ISSN: 1559128X NLM ISO Abbreviation: Appl Opt Subsets: PubMed not MEDLINE
Imprint Name(s): Publication: Washington, DC : Optica Publishing Group
Original Publication: Easton, Pa., Optical Society of America.
Abstract: In this work, we analyze the diffraction produced by Ronchi gratings where the fill factor is not constant, but presents random fluctuations around its nominal value. This effect can be produced while developing the grating with etchers since the process can be slightly unpredictable. We obtain the theoretical formalism to describe the intensity produced by the grating at near and far field, showing that smoothing of the self-images is produced at the near field and, consequently, cancellation of higher diffraction orders is obtained at the far field. In addition, different nominal fill factors produce different diffraction behaviors in terms of the randomness. We corroborate the analytical formalism using a direct integration method based on the Rayleigh-Sommerfeld formula and conclude that the numerical results are in high agreement with the theoretical predictions.
Entry Date(s): Date Created: 20171020 Date Completed: 20180205 Latest Revision: 20181023
Update Code: 20250114
DOI: 10.1364/AO.56.005253
PMID: 29047580
Datenbank: MEDLINE
Beschreibung
Abstract:In this work, we analyze the diffraction produced by Ronchi gratings where the fill factor is not constant, but presents random fluctuations around its nominal value. This effect can be produced while developing the grating with etchers since the process can be slightly unpredictable. We obtain the theoretical formalism to describe the intensity produced by the grating at near and far field, showing that smoothing of the self-images is produced at the near field and, consequently, cancellation of higher diffraction orders is obtained at the far field. In addition, different nominal fill factors produce different diffraction behaviors in terms of the randomness. We corroborate the analytical formalism using a direct integration method based on the Rayleigh-Sommerfeld formula and conclude that the numerical results are in high agreement with the theoretical predictions.
ISSN:1539-4522
DOI:10.1364/AO.56.005253