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The realization of praseodymium nickelate based IT-SOFC cathode by physical deposition: Reactive magnetron sputtering combined with annealing treatment.

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Title: The realization of praseodymium nickelate based IT-SOFC cathode by physical deposition: Reactive magnetron sputtering combined with annealing treatment.
Authors: Ye, Xiaolei1,2 (AUTHOR), Luo, Hang1,2 (AUTHOR), Gao, Lei1,2 (AUTHOR) glkust2013@hotmail.com, Yang, Li1,2 (AUTHOR) yanglikmust@163.com, Guo, Shenghui1,2 (AUTHOR) shguo78@hotmail.com, Hou, Ming1,2 (AUTHOR), Chen, Kaihua1,2 (AUTHOR), Li, Yunchuan1,2 (AUTHOR), Hua, Zhiguang3 (AUTHOR), Briois, Pascal4 (AUTHOR)
Source: Ceramics International. Nov2025:Part C, Vol. 51 Issue 26, p50834-50843. 10p.
Subject Terms: *MAGNETRON sputtering, *SOLID oxide fuel cells, *HEAT treatment, *DURABILITY, *ELECTRIC resistance, *POWER (Mechanics), *NICKEL oxide
Abstract: The simplified preparation of high-performance cathode layers is crucial for advancing the widespread commercial utilization of solid oxide fuel cells (SOFCs). This investigation centers on achieving Pr 2 NiO 4 @Pr 6 O 11 (PPNO) through reactive magnetron sputtering (RMS) under the monitoring of a plasma emission monitoring system (PEM) in conjunction with annealing treatment. By utilizing the PEM system, a Setpoint of 70 % was selected to enable a rapid deposition rate of Pr-O oxide. Subsequently, a Pr-Ni-O oxide with an appropriate Pr/Ni atomic ratio was deposited by regulating the power applied to the Ni target. The PPNO cathode layer was formed through the annealing of Pr-Ni-O oxide (at 1000 °C for 30 min). Moreover, the porosity evolution of the PPNO cathode layer was elucidated. The deposited PPNO cathode demonstrates a remarkably low polarization resistance (R p) of 0.08 Ω cm2 at 750 °C. The assembled NiO-YSZ|YSZ|GDC|PPNO single cell achieves a notable power density of 1155 mW cm−2 at 750 °C. Furthermore, the single cell experiences only 6.9 % decay after 65 h of stability testing at 700 °C, indicating interesting long-term stability. This research introduces a fresh perspective on the realizing high-performance IT-SOFC cathode layers. [ABSTRACT FROM AUTHOR]
Database: Academic Search Index
Description
Abstract:The simplified preparation of high-performance cathode layers is crucial for advancing the widespread commercial utilization of solid oxide fuel cells (SOFCs). This investigation centers on achieving Pr 2 NiO 4 @Pr 6 O 11 (PPNO) through reactive magnetron sputtering (RMS) under the monitoring of a plasma emission monitoring system (PEM) in conjunction with annealing treatment. By utilizing the PEM system, a Setpoint of 70 % was selected to enable a rapid deposition rate of Pr-O oxide. Subsequently, a Pr-Ni-O oxide with an appropriate Pr/Ni atomic ratio was deposited by regulating the power applied to the Ni target. The PPNO cathode layer was formed through the annealing of Pr-Ni-O oxide (at 1000 °C for 30 min). Moreover, the porosity evolution of the PPNO cathode layer was elucidated. The deposited PPNO cathode demonstrates a remarkably low polarization resistance (R p) of 0.08 Ω cm2 at 750 °C. The assembled NiO-YSZ|YSZ|GDC|PPNO single cell achieves a notable power density of 1155 mW cm−2 at 750 °C. Furthermore, the single cell experiences only 6.9 % decay after 65 h of stability testing at 700 °C, indicating interesting long-term stability. This research introduces a fresh perspective on the realizing high-performance IT-SOFC cathode layers. [ABSTRACT FROM AUTHOR]
ISSN:02728842
DOI:10.1016/j.ceramint.2025.08.309