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High-rate magnetron sputter deposition of low-stress boron carbide films on tilted substrates.

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Title: High-rate magnetron sputter deposition of low-stress boron carbide films on tilted substrates.
Authors: Kawasaki, K.1, Merlo, J. B.1, Gonzalez, S.1, Bayu Aji, L. B.1, Shin, S. J.1, Taylor, G. V.1, Engwall-Holmes, A. M.1, Seo, M.1, Baker, A. A.1, Wong, M. S.1,2, O'Neill, F. M.1, Kucheyev, S. O.1 kucheyev@llnl.gov
Source: Journal of Applied Physics. 9/14/2025, Vol. 138 Issue 10, p1-13. 13p.
Subject Terms: *BORON carbides, *MAGNETRON sputtering, *INERTIAL confinement fusion, *SURFACE coatings, *RESIDUAL stresses, *MICROSTRUCTURE
Abstract: Boron carbide is attractive for several applications, including nuclear fuel capsules for inertial confinement fusion (ICF). The fabrication of ICF capsules involves the deposition of ultrathick coatings with density and thickness uniformity on submicron length scales on non-planar (spherical) substrates. Such a deposition requires control of the deposition rate, residual stress, and film microstructure. Here, we systematically study the direct-current magnetron sputter deposition of B 4 C coatings with a full-face-erosion magnetron source as a function of substrate tilt and Ar working gas pressure. Film properties are correlated with results of plasma diagnostics and predictions of Monte Carlo simulations of ballistic sputtering and gas-phase transport. The fabrication of low-stress amorphous B 4 C films with deposition rates of 7 μ m / h is demonstrated. [ABSTRACT FROM AUTHOR]
Database: Academic Search Index
Description
Abstract:Boron carbide is attractive for several applications, including nuclear fuel capsules for inertial confinement fusion (ICF). The fabrication of ICF capsules involves the deposition of ultrathick coatings with density and thickness uniformity on submicron length scales on non-planar (spherical) substrates. Such a deposition requires control of the deposition rate, residual stress, and film microstructure. Here, we systematically study the direct-current magnetron sputter deposition of B 4 C coatings with a full-face-erosion magnetron source as a function of substrate tilt and Ar working gas pressure. Film properties are correlated with results of plasma diagnostics and predictions of Monte Carlo simulations of ballistic sputtering and gas-phase transport. The fabrication of low-stress amorphous B 4 C films with deposition rates of 7 μ m / h is demonstrated. [ABSTRACT FROM AUTHOR]
ISSN:00218979
DOI:10.1063/5.0283657