Absorbed dose threshold for single-layer ZrO2, HfO2, and Al2O3 dielectric coatings at 355 nm

This study investigates ultraviolet laser-induced fatigue and absorptance dynamics in single-layer Al2O3, HfO2, and ZrO2 dielectric coatings on fused silica substrates using 355 nm, 10 ps pulses at a repetition rate of 1 MHz. Laser-induced damage threshold testing, combined with photothermal common-...

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Veröffentlicht in:Optics letters Jg. 50; H. 16; S. 4910
Hauptverfasser: Atkočaitis, Erikas, Melninkaitis, Andrius
Format: Journal Article
Sprache:Englisch
Veröffentlicht: 15.08.2025
ISSN:1539-4794, 1539-4794
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Zusammenfassung:This study investigates ultraviolet laser-induced fatigue and absorptance dynamics in single-layer Al2O3, HfO2, and ZrO2 dielectric coatings on fused silica substrates using 355 nm, 10 ps pulses at a repetition rate of 1 MHz. Laser-induced damage threshold testing, combined with photothermal common-path interferometry, reveals that the formation of the "color change" damage is a multistage, cumulative process, dependent on material treatment and laser intensity. These findings offer insights into optical fatigue mechanisms and provide a pathway for non-catastrophic lifetime assessment of optical coatings based on the accumulation threshold of the absorbed dose.This study investigates ultraviolet laser-induced fatigue and absorptance dynamics in single-layer Al2O3, HfO2, and ZrO2 dielectric coatings on fused silica substrates using 355 nm, 10 ps pulses at a repetition rate of 1 MHz. Laser-induced damage threshold testing, combined with photothermal common-path interferometry, reveals that the formation of the "color change" damage is a multistage, cumulative process, dependent on material treatment and laser intensity. These findings offer insights into optical fatigue mechanisms and provide a pathway for non-catastrophic lifetime assessment of optical coatings based on the accumulation threshold of the absorbed dose.
Bibliographie:ObjectType-Article-1
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ISSN:1539-4794
1539-4794
DOI:10.1364/OL.566304