Absorbed dose threshold for single-layer ZrO2, HfO2, and Al2O3 dielectric coatings at 355 nm
This study investigates ultraviolet laser-induced fatigue and absorptance dynamics in single-layer Al2O3, HfO2, and ZrO2 dielectric coatings on fused silica substrates using 355 nm, 10 ps pulses at a repetition rate of 1 MHz. Laser-induced damage threshold testing, combined with photothermal common-...
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| Vydané v: | Optics letters Ročník 50; číslo 16; s. 4910 |
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| Hlavní autori: | , |
| Médium: | Journal Article |
| Jazyk: | English |
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15.08.2025
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| ISSN: | 1539-4794, 1539-4794 |
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| Abstract | This study investigates ultraviolet laser-induced fatigue and absorptance dynamics in single-layer Al2O3, HfO2, and ZrO2 dielectric coatings on fused silica substrates using 355 nm, 10 ps pulses at a repetition rate of 1 MHz. Laser-induced damage threshold testing, combined with photothermal common-path interferometry, reveals that the formation of the "color change" damage is a multistage, cumulative process, dependent on material treatment and laser intensity. These findings offer insights into optical fatigue mechanisms and provide a pathway for non-catastrophic lifetime assessment of optical coatings based on the accumulation threshold of the absorbed dose.This study investigates ultraviolet laser-induced fatigue and absorptance dynamics in single-layer Al2O3, HfO2, and ZrO2 dielectric coatings on fused silica substrates using 355 nm, 10 ps pulses at a repetition rate of 1 MHz. Laser-induced damage threshold testing, combined with photothermal common-path interferometry, reveals that the formation of the "color change" damage is a multistage, cumulative process, dependent on material treatment and laser intensity. These findings offer insights into optical fatigue mechanisms and provide a pathway for non-catastrophic lifetime assessment of optical coatings based on the accumulation threshold of the absorbed dose. |
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| AbstractList | This study investigates ultraviolet laser-induced fatigue and absorptance dynamics in single-layer Al2O3, HfO2, and ZrO2 dielectric coatings on fused silica substrates using 355 nm, 10 ps pulses at a repetition rate of 1 MHz. Laser-induced damage threshold testing, combined with photothermal common-path interferometry, reveals that the formation of the "color change" damage is a multistage, cumulative process, dependent on material treatment and laser intensity. These findings offer insights into optical fatigue mechanisms and provide a pathway for non-catastrophic lifetime assessment of optical coatings based on the accumulation threshold of the absorbed dose.This study investigates ultraviolet laser-induced fatigue and absorptance dynamics in single-layer Al2O3, HfO2, and ZrO2 dielectric coatings on fused silica substrates using 355 nm, 10 ps pulses at a repetition rate of 1 MHz. Laser-induced damage threshold testing, combined with photothermal common-path interferometry, reveals that the formation of the "color change" damage is a multistage, cumulative process, dependent on material treatment and laser intensity. These findings offer insights into optical fatigue mechanisms and provide a pathway for non-catastrophic lifetime assessment of optical coatings based on the accumulation threshold of the absorbed dose. |
| Author | Atkočaitis, Erikas Melninkaitis, Andrius |
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| Title | Absorbed dose threshold for single-layer ZrO2, HfO2, and Al2O3 dielectric coatings at 355 nm |
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